Used TEL / TOKYO ELECTRON ACT 12 #9402603 for sale
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A TEL / TOKYO ELECTRON ACT 12 photoresist equipment is a lithographic system used to fabricate semiconductor wafers. The unit applies a light-sensitive film, known as photoresist, to chemically modify a wafer's surface. It uses ultraviolet (UV) light to selectively affect the photoresist which enables the creation of patterned layers on the wafer's surface. TEL ACT 12 machine is composed of four main components: light sources, control tool, resist applicator, and stage. The light sources use lamps and light guides to evenly apply UV light onto the wafer's surface. The asset's control model contains several controlling functions, such as programmable methods for controlling the light intensity, and software-controlled timing mods. The resist applicator enables the coating of photoresist onto the wafer and controls the thickness of the film. The stage is used to precisely move the wafer in a way that allows the UV light to cover the entire surface. TOKYO ELECTRON ACT12 equipment's UV light can be focused to create both single and multi-layered designs on the wafer. This allows for a wide range of device designs, from microchips with micron-scale features to thin layers of molecules. Furthermore, its advanced control system provides a high degree of accuracy to ensure the uniform deposition of resist. ACT12 unit uses advanced features such as Automatic Pattern Recognition (APR) and autofocus correction to ensure precision and accuracy. APR is a method of using a sensing device to detect the changes in pattern created during the "exposure" phase of the UV light sources. Autofocus correction is an algorithm which corrects small deviations in the level of UV light, resulting in a uniform pattern throughout the wafer. In conclusion, TOKYO ELECTRON ACT 12 photoresist machine is a powerful tool used in semiconductor wafer processing. It utilizes UV light sources, a resist applicator, and a highly advanced control tool to create uniform and accurate patterns. APR and autofocus correction results in reliable and efficient operation, allowing for the fabrication of complex devices.
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