Used TEL / TOKYO ELECTRON ACT 8 SOG #9105809 for sale

TEL / TOKYO ELECTRON ACT 8 SOG (Sub-Micron Optical grating) is a state-of-the-art photoresist equipment designed specifically for the fabrication of submicron features. It utilizes advanced optical grating technology to transfer high resolution patterns of up to 20nm onto the surface of semiconductor wafers. The photoresist is then used to create sub-micron structures, lines and gaps for device fabrication. TEL ACT 8 SOG has the ability to produce features with extremely high resolution, and can accurately reproduce a pattern with a depth of 20nm onto a semiconductor wafer. This enables the production of extremely precise components with extremely high accuracy. This is key to the successful production of high-density memory chips and semiconductor devices such as NAND memory, which require high resolution photolithography to produce the ultra-short component widths. The system uses a long-life, high power laser source to provide illumination for the highest resolution possible, and this is combined with a high dynamic range CCD camera and closed loop alignment unit for accurate alignment of the photoresist onto the wafer. With this set-up, patterns can be produced with the highest accuracy and clarity. The photoresist machine has an advanced multi-layer compensation module that uses optical diffraction models to precisely adjust and correct the grating design, enabling it to produce patterns with extremely shallow angles and shapes. The pattern can be adjusted in order to make corrections when a pattern is optimized to meet the specific needs of the device fabrication process. TEL ACT 8 tool also has an anti-reflection coating module which helps reduce interference from reflected light, allowing higher contrast and sharper side walls for the production of better resolution devices. The asset also utilizes advanced maskless operation to control the pattern of the photoresist. This feature enables it to produce patterns without the need for any masks, thereby greatly reducing process time and complexity. Overall, TOKYO ELECTRON ACT 8 SOG is an advanced photoresist model that enables for the production of high resolution devices with extremely high accuracy and even extremely shallow angle and shaped structures. This equipment can greatly reduce process time and costs, and help greatly improve the quality of semiconductor components.