Used TEL / TOKYO ELECTRON ACT 8 #9127707 for sale

TEL / TOKYO ELECTRON ACT 8 photoresist equipment is a powerful tool for those requiring precise nano-scale lithography fabrication in the microelectronics industry. The system is designed to enable the etching of thin electronic components on a wide variety of substrates. The unit can accurately etch features down to 400 nanometers in size, which is exceptionally small. By using a photomask to shield the wafer from resistive light, the machine can define elements on the substrate accurately. TEL ACT 8 photoresist tool has three main components: a wafer handler, an unified digital micromirror device (DMD), and a proprietary two dimensional (2D) imaging software. The wafer handler is the main component of the asset and it is responsible for securely handling the wafer substrate. It is equipped with a thermal chuck to maintain a constant temperature to ensure an even etching throughout the substrate. Additionally, the wafer handler features special optics that have both an automated and z-height scanning model. The unified DMD is an advanced component that is used for programmed masking. It includes two separate components—a transparent optics component and a two-dimensional imaging component. The first component provides extremely fast resolution at nanometer accuracy, while the second component guarantees phase focusing stability during exposure. This mechanism ensures a uniform, accurate etching of the substrate. The final part of TOKYO ELECTRON ACT 8 photoresist equipment is the proprietary 2D imaging software. This software enables precise imaging with microlITHO scripting—a powerful tool utilized to design and refine masks for the device. It also features auto-correction functions that can adjust images during imaging and etching to guarantee the perfect design. TEL ACT 8 photoresist system offers many advantages over previous systems. With its nano-scale resolution and automated imaging abilities, the unit is perfect for nano-scale lithography and production of ultra-thin components and substrates. This makes the machine a powerful tool for the production of microelectronics on a variety of materials. Moreover, its proprietary two-dimensional (2D) software allows for precise imaging and microlITHO scripting to guarantee a perfect design.