Used TEL / TOKYO ELECTRON ACT 8 #9142704 for sale

TEL / TOKYO ELECTRON ACT 8 is a photoresist equipment that is used in the manufacture of electronic devices, such as integrated circuits (ICs), display panels and microelectromechanical systems (MEMS). The system is based on a pattern transfer technology and is used to create precision patterns on the surface of a substrate. It consists of a digital mask writer, exposure unit, photoresist, developer, etchant, and plating units. The unit optimizes the process flow and simplifies the lithography process. The digital mask writer is used to create the mask pattern that will be transferred onto the substrate. This mask is then illuminated from either an Ultra Violet (UV) source or an Electron Beam Source (EBS) light source. The intensity of the light can be adjusted to allow for different depths of exposure. The exposure unit is designed to offer high accuracy and repeatability in pattern transfer. It contains a precision maskholder, as well as high contrast illuminator and adjustable UV illuminator giving the user ultimate control over the exposure process. The photoresist is a polymer specially designed to absorb the radiation and change its characteristics. It becomes soluble when exposed to the appropriate wavelengths of UV light or an EBS. When the desired exposure levels have been reached, the photoresist is ready to be washed or dipped in the developer to remove any unexposed areas. The developer is a solution used to etch and shape the surface of the substrate. The developer needs to be constantly maintained and monitored to make sure that the photoresist does not become over exposed. The etchant is then used to cut, shape and smooth the substrate. It works by removing any exposed area on the substrate. The etching process can be adjusted to achieve the desired width and depth with precision. Finally, the plating unit can be used to add a metal or alloy coating on any exposed area on the substrate. The coating is applied in a single exposed area in order to achieve the desired shape and size. In conclusion, TEL ACT 8 photoresist machine is an ideal tool for creating accurate and precise patterns on the surface of a substrate. It has a digital mask writer for quickly and easily creating a mask pattern, an adjustable UV/EBS light source for achieving the desired depth of exposure, a photoresist stage to make sure the pattern is properly exposed, and a developer etch and plater stage for adding any desired coating or alloy layer. This comprehensive tool allows for quick, accurate and reliable pattern transfer to ensure that the devices come out looking perfect.