Used TEL / TOKYO ELECTRON ACT 8 #9142708 for sale

TEL / TOKYO ELECTRON ACT 8 (TEL/TE TEL ACT 8) is a photoresist equipment developed by TOKYO ELECTRON (TEL / TOKYO ELECTRON). This system is designed for the fabrication of high-quality integrated circuits by using an exposure and development process. The unit consists of a series of physical components, including an ultra-high frequency scanner, an energy source, and a substrate holder. The scanner is used to align and direct a high-intensity beam of light of a certain exposure wavelength onto the substrate holder. The beam of light is then modulated by an Electric-Field-Plasma (E-F-P) controller, allowing for precise and repeatable exposure of the photoresist layer. The substrate holder is designed to hold the substrate and photoresist layers during the exposure process. It has been engineered to minimize the effect of the substrate heating caused by the E-F-P controller. Finally, the machine is also equipped with a number of safety features, such as an emergency stop switch, which allow operators to stop the process automatically in an emergency situation. TEL/TE TOKYO ELECTRON ACT 8 photoresist tool is extremely precise and highly reliable. It is capable of producing relatively large patterns, such as standard cells, at a resolution of 0.18 microns, with a feature size of 0.25 microns. This allows for high-density integration of circuits, and makes it ideal for advanced products such as memories and microprocessors. In addition, the asset has a very low pixel-to-pixel distortion rate of 0.5%, ensuring that pattern accuracy is maintained over an extended period of time. This distortion rate is further improved by the ability of TOKYO ELECTRON/TE ACT 8 to program multiple exposures on the same pattern. In summary, TOKYO ELECTRON ACT 8 is a highly reliable photoresist model that provides precise patterning and high-density integration of circuits. Its features include a modulation of the light source via an E-F-P controller, minimal substrate heating, and a low pixel-to-pixel distortion rate. This equipment represents an excellent choice for the fabrication of advanced integrated circuits.