Used TEL / TOKYO ELECTRON ACT 8 #9183643 for sale

TEL / TOKYO ELECTRON ACT 8 is a photoresist equipment that combines advanced exposure control technology with lithography processes. Using proprietary exposure control and positioning algorithms, the system ensures high precision and accuracy in line width exposure and alignment. In addition, the unit's fast response and reliable exposure energy compensation ensure excellent line width uniformity across wafers. TEL ACT 8 machine uses large-area high-resolution wafer imaging exposure control technology to ensure excellent step and repeat accuracy and alignment. This includes automated exposure control tool algorithms that provide advanced exposure control and exposure control fine-tuning for effective exposure management. Furthermore, its large-area imaging and high optical magnification ensure the asset can inspect small defects, fine patterns, and contact holes in high-precision lithography processes. TOKYO ELECTRON ACT 8 model provides high precision alignment using software controlled microscope scanning to assist with high accuracy and repeatable exposure efficiency. In addition, its wafer handler and scanner offer up to 30 micron step-and-repeat accuracy, which ensure high quality and more uniform lithography processes. TEL ACT 8 equipment also comes with an advanced process monitor that continuously monitors exposure stability and pattern size variation in order to accurately maintain output. In addition, the system has an integrated Automatic Defect Inspection Analysis (ADIA) program that automatically detects abnormalities during the lithography process. This allows users to quickly identify any potential issues and reduce defects in production. In summary, TEL / TOKYO ELECTRON ACT 8 is a high performance photoresist unit. It combines advanced exposure control technology with lithography processes, ensuring high precision and accuracy in line width exposure and alignment. Its fast response and reliable exposure energy compensation ensures excellent line width uniformity across wafers, while its large-area imaging and advanced Process Monitor and ADIA programs provide ability to identify potential issues and reduce defects.