Used TEL / TOKYO ELECTRON ACT 8 #9216895 for sale

TEL / TOKYO ELECTRON ACT 8 is a Photoresist Equipment used in lithography processes of IC and other microelectronic manufacturing, particularly in Semiconductor Fabrication Lines. The system enables precise and detailed control over the exposure of a photoresist, which acts like a light-sensitive coating that can be selectively exposed and is used to pattern ICs and other microelectronic devices on the nanoscale. TEL ACT 8 makes use of a two-step control unit, by which the first steps involves pre-exposure before the final exposure occurs. The pre-exposure setting is an important feature, as it allows for precise control over the exposure energy, which is one of the key parameters that determines the final features of the pattern that is formed on the photoresist. By controlling the energy of the pre-exposure accurately, a finer definition can be achieved in the features that are patterned in the photoresist. Additionally, the pre-exposure setting also allows for curable flooding to get rid of contaminants and allow for more precise patterning. The machine also includes a Post-Exposure Bake (PEB) function, which further optimizes the exposure processes by hardening the photoresist and properly curing it. In this step, the photoresist is heated at a temperature that helps to solidify the structure, thus allowing for more accurate and precise microelectronic patterning. TOKYO ELECTRON ACT 8 also features advanced control tools and software for overseeing the exposure process. It utilizes advanced algorithms and feedback loops to determine the optimal parameters for each exposure and allows the user to fine-tune the settings to ensure that the photoresist is exposed correctly and at the right energy. Additionally, the tool provides multiple diagnostics and alert functions to indicate any potential issues that may arise during the exposure process. Overall, TEL / TOKYO ELECTRON ACT 8 is an advanced Photoresist Asset that provides high-precision and detailed control over the exposure of photoresists used in lithography processes of ICs and other microelectronic devices. Its two-step model and advanced algorithms and feedback loops ensure that the exposure process is accurate and up to the highest standards in order to produce the desired patterns at the nanoscale.