Used TEL / TOKYO ELECTRON Clean Track ACT 8 #9219615 for sale

TEL / TOKYO ELECTRON ACT 8 is a "Deep UV" photoresist equipment designed for integrated circuit fabrication. Photoresists are light-sensitive materials that are used in semiconductor fabrication processes to create features on various layers. TEL ACT 8 system is designed to provide very high sensitivity and resolution when compared to other photoresists on the market. TOKYO ELECTRON ACT 8 unit is composed of two separate components: a negative photoresist and an acid diffusion screen. The negative photoresist is applied to the substrate using spray or spin coating techniques. When exposed to ultraviolet light of sufficient intensity, it polymerizes, becoming insoluble and non-absorbent. This allows fine lines and other structures to be created. The acid diffusion screen, which is applied after the photoresist, is used to control the size of the features formed. It reacts with selected components of the photoresist, creating a layer of microscopic bubbles that act as an etch mask. This layer has a higher etch rate than the surrounding photoresist, allowing smaller features to be formed. The hardening of the photoresist and acid diffusion screening ensure that the features are stable and free from contamination. These features can then be used for subsequent lithography, allowing for further circuit formation. ACT 8 machine provides advantages in terms of exposing speed, sensitivity, and resolution. Due to its high sensitivity, shorter exposure times can be used, which translates to higher production throughput. It also has the ability to produce lines down to resolutions of 0.2 microns and spaces down to 0.1 microns, making it suitable for the newest IC fabrication processes. TEL ACT 8 tool is an excellent choice for those looking for a highly reliable and high resolution photoresist solution for their integrated circuit fabrication needs. Its fast exposure speed, sensitivity and accuracy mean that it will stand up to the most demanding of production conditions.