Used TEL / TOKYO ELECTRON ACT 8 #9220020 for sale

TEL / TOKYO ELECTRON ACT 8 is a photoresist equipment used in microelectronics fabrication. It is a fully automated system designed to provide the highest levels of accuracy and repeatability for precision photolithography due to its patented Optically Automated Lithography™ (OAL™) technology. TEL ACT 8 unit is designed to meet modern, high-volume production demands with its automated and accurate calibration of focus, wafer alignment, pattern alignment, overlay and rotation in less than 90 minutes for up to 8 wafers simultaneously. It is capable of processing wafers up to 8 inches and with a resolution of 0.1 micron. The machine is equipped with a suite of highly integrated and sophisticated manufacturing functions. An ultra-high-speed, dual-laser-scanned-exposure (LDSE) module performs photo exposure with high-accuracy and stability. A five-axis alignment tool with two-axis rotation and an image recognition technology provides accurate alignment of critical features of wafers. The asset is also equipped with a patented lens protection model that prevents contact between the lens surface and the wafer, to ensure a longer life for the lens. A wafer transport module with a scanning mechanism also allows easy transport of exposed wafers. Furthermore, a compact and efficient dust-free container equipment is used to ensure a clean working environment. TOKYO ELECTRON ACT 8 system is also capable of supporting different types of photoresists including ArF photoresist for ultra-high resolution and high yield applications, I-line and KrF photoresists for lower resolution and other applications. It also allows for a wide range of etch chemistries for a variety of microelectronics manufacturing needs. ACT 8 photoresist unit is an advanced and reliable machine for the production of microelectronics components with high resolution and yields. It has several advanced features, such as the automated calibration of process parameters and its highly integrated manufacturing functions. Its proven accuracy and repeatability set it apart from other photolithography systems and make it an ideal solution for production with high volumes of critical components.