Used TEL / TOKYO ELECTRON ACT 8 #9229569 for sale
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ID: 9229569
Wafer Size: 12"
Vintage: 2002
Coater / Developer system, 8"
2002 vintage.
TEL / TOKYO ELECTRON ACT 8 is a photoresist equipment produced by TEL Corporation and is one of the more advanced photoresist tools used by companies in the semiconductor industry that require precise deep-UV light exposure capabilities. TEL ACT 8 system is designed to provide very stable, uniform, and controllable exposure of materials that require deep-UV light exposure such as silicon wafers, lithography test masks, and resist materials. The unit is designed with an exposure chamber that comprises of a high-output mercury vapor lamp and uses reflection exposure methods to ensure optimal exposure results. TOKYO ELECTRON ACT 8 machine includes an automated controller tool which is designed to provide accurate focusing and alignment, monitor exposure processes, and provide feedback and corrections on-the-fly during the exposure process. This exposure control asset is also equipped with an optical and UV intensity sensor and is capable of recognizing optimum exposure times, focal points, and exposure results. The model can be configured with an optical shutter mechanism, enabling multi-layer resists with smooth and even transitions to be exposed or combined with multiple resist layers before being exposed. This allows users to achieve more complex patterns with optical alignment and more accurately transferred patterns with greatly reduced unevenness and shape variations. ACT 8 equipment also includes a substrate pre-bake feature that ensures that the substrate is pre-baked before exposure to the deep-UV light. This allows users to ensure that the materials undergoing exposure will be properly bonded and well-prepared prior to exposure. The pre-bake feature also helps reduce curing times for exposure materials, ensuring that the exposure process is faster and more reliable. Overall, TOKYO ELECTRON ACT 8 system is one of the more advanced photoresist systems available in the industry. It is designed with advanced features and excellent precision to ensure superior deep-UV light exposure capabilities. The exposure control unit, pre-bake feature, and shutter mechanism make the machine a reliable and highly customizable solution for companies who require repeatable and reliable photoresist processing capabilities.
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