Used TEL / TOKYO ELECTRON ACT 8 #9235231 for sale

TEL / TOKYO ELECTRON ACT 8 is an advanced photoresist equipment designed to provide photolithography and photohardening services for advanced microelectronic process applications. The system combines a highly accurate optical imaging alignment technology, advanced image processing, and precise automation control technologies to optimize the photolithography process with extreme precision. An advanced optoelectronic imaging unit is used to align and monitor the exposure of substrates onto the photoresist film. The machine inspects the substrate to verify the alignment and determine the areas to be exposed. The optical imaging process utilizes laser interference or imaging sensors to conduct a precise alignment of the substrate and the photoresist film. The onboard imaging tool allows the photolithographic exposure to be adjusted, ensuring the best image quality regardless of process variations or substrate type. The asset is designed to produce high-resolution images with minimal exposure to photohardening chemicals. To achieve this, the model incorporates a high-efficiency, low-noise CCD (Charge-Coupled Device) imaging technology that can quickly acquire a large number of images with a high contrast ratio. The CCD imaging technology also reduces noise and allows for efficient exposure control. The photoresist equipment also incorporates a wide range of automation and process control capabilities. It has a large database of recipes that allow for easy customization of the photoresist recipe and provides a high degree of flexibility in the management of photoresist exposure. The automated system also incorporates a self-diagnostic capability that can detect errors in the photoresist material and solve problems caused by photolithography errors. To ensure absolute accuracy of the photoresist unit, the machine is equipped with an automated substrate inspection tool that is capable of measuring the specifications and quality level of the photoresist film. The asset can also automatically detect any irregularities in the photoresist film and provide corrective action, ensuring consistent quality across all processes. In summary, TEL ACT 8 model is an advanced photoresist equipment incorporating high-precision optical alignment, advanced CCD imaging, and enhanced process control capabilities to provide highly accurate photolithographic and photohardening services for microelectronic process applications. The system's accuracy, efficiency, and adaptability make it an ideal choice for the most advanced microelectronic applications.