Used TEL / TOKYO ELECTRON ACT 8 #9235266 for sale
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ID: 9235266
Wafer Size: 8"
System, 8"
Wafer flow: Left to right
Wafer type: Notch / Flat
Cassette block (CSB): Open type
Process block (PRB): 1 Block
Interface block (IFB)
CANON FPA-3000 i5 Exposure system
Chemical box:
Solvent: (2) Buffer tanks and degas module
HMDS: Buffer tank and canister tank
Solution: (2) Buffer tanks and (2) Degas modules
Drain: COT Drain poly tank
With fire extinguisher system
Temperature and humidity 1: COSAM SPA-Series
No temperature and humidity 2
Temperature control unit (TCU) 1: INR Series
AC Power box
No back-up module in AC power box
(7) Parts boxes
Missing part in AC box
Cassette block (CSB):
No ULPA fan unit
Display panel
Alarm tower
Loader
No carrier reader sensor
CRA:
X, Y, TH, Z Motor set
X, Y, TH, Z Drive set
Tweezer
Mapping sensor
Wafer check sensor
No AGV system
MSE 343B DC Power box
CSB Chemical area:
Resist pump: (8) T-F200 Series RRC Pumps
Resist bottle: Gallon bottle and quart bottle
Resist filter:
(4) Impact type
(4) Housing type
(8) LE Tanks: 200cc
Process block (PRB) 2:
FAN Unit
TH Drive
PRA:
X1, 2, 3, Z Motor and drive
Pincette and wafer block
Wafer sensor
Coater (COT):
(4) Dispense nozzles
Nozzle arm 1 and 2
Chuck
Back rinse nozzle
No BARC coater (COT)
TARC Coater (TCT):
(2) Dispense nozzles
Nozzle arm 1 and 2
Chuck
Back rinse nozzle
CUP Set
Developer (DEV):
Dispense nozzle: H Nozzle
Nozzle arm 1 and 2
Chuck
Back rinse nozzle
CUP Set
Process block (PRB) 2: Oven
ADH
LHP
No HHP
No HCH
CPL
No PHP
No PCH
CHP
No TCP
TRS
CWH
IFB (Interface block):
FAN Unit
EIS Type: CANON
IRA:
X, TH, Y, Z Motor and drive
Tweezer and wafer block
Wafer sensor
WEE:
X Motor and drive
Chuck
Exposure type: DUV-Line
Exposure sensor: 254 UV.
TEL / TOKYO ELECTRON ACT 8 is a photoresist equipment that is used for the production of electronic printed circuits. The system is capable of enabling the production of devices ranging from small to large sizes, with repeatable and robust fabrication processes. TEL ACT 8 consists of a photoresist processor, a mask aligner, and a defect inspection unit. The photoresist processor enables the application of light to a surface of the circuit board, which assists in the selectivity and speed of the etching process. The mask aligner allows the user to precisely align the mask onto the circuit board, such that the photoresist material is applied in the correct positions for etching. Finally, the defect inspection machine monitors the photoresist material for defects and blemishes, ensuring that the end result is of the highest quality. TOKYO ELECTRON ACT 8 is designed to offer superior precision and accuracy. The tool supports high levels of accuracy, as it can resolve features down to 0.5 microns in size. This precision allows for very small and intricate circuits to be accurately produced. The asset also enables the flexibility to produce large panels in one step, with fast switching times and robust processes that are highly repeatable. TEL / TOKYO ELECTRON ACT 8 is a highly reliable and consistent solution for the production of prototype and production printed circuits. The model is compatible with a variety of photoresist materials, enabling users to customize their processes for best results. It is also capable of handling various substrates and board types, allowing it to be used across a broad range of applications. Overall, ACT 8 is a reliable and comprehensive photoresist equipment that is designed to enable the production of high-quality printed circuits. The system is highly accurate and repeatable, offering superior precision and accuracy for complex circuit designs, and it is compatible with a variety of materials and substrates for broad application versatility.
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