Used TEL / TOKYO ELECTRON ACT 8 #9236700 for sale

TEL / TOKYO ELECTRON ACT 8 is a photoresist equipment used in the fabrication of semiconductor devices. Photoresist systems use ultraviolet light or X-rays to produce images on semiconductor substrates. TEL ACT 8 system employs a high-energy ultraviolet light source designed for lithography with DUV resist materials. It features a 64-bit architecture with a 9 inch color LCD touchscreen as well as a built-in web browser. The unit is capable of focal lengths of 25 and 105mm and has a working distance of 200mm. TOKYO ELECTRON ACT 8 machine is designed to provide high resolution imaging of integrated circuits (ICs) and other electronics components. It produces highly accurate images with high contrast levels and excellent linearity. The tool is also capable of providing excellent linearity at an angle, allowing for precise optical alignment of the imaging asset. The model is also capable of producing resolutions up to a 20-nanometer mark. ACT 8 equipment comes with various imaging modes to meet different processing requirements. These modes include mask-exposure, direct-print, scan-and-print, and line-exposure. Mask-exposure mode produces high-density images and is suitable for producing imaging elements with a high degree of accuracy. Direct-print mode is used to produce accurate images of an IC without requiring lithography masks. Scan-and-print mode allows for scanning and printing of an IC in one continuous pass. Line-exposure mode is used to produce various vector elements such as line, dimensions and text. ACT 8 system is an efficient, reliable and cost-effective alternative for electronic and lithography production. It offers high precision imaging, excellent linearity and stability, and high throughput. The unit's compact design and portability allows for use in multiple applications and processes, making it an ideal choice for prototypes and small to high-volume production runs.