Used TEL / TOKYO ELECTRON ACT 8 #9238389 for sale

TEL / TOKYO ELECTRON ACT 8
ID: 9238389
Wafer Size: 8"
Vintage: 1999
Coater / Developer system, 8" 1999 vintage.
TEL / TOKYO ELECTRON ACT 8 is a photoresist equipment designed and acquired by TEL Corporation of TOKYO ELECTRON Ltd. It is an optics-based, automated photolithography system used in the production of semiconductor devices. This unit is designed to enable the accurate and high-resolution fabrication of lithography masks used in the manufacture of modern semiconductors. TEL ACT 8 is composed of several components, including an illumination source, lens machine, reticle alignment tool, and an exposed photoresist asset. The illumination source used by the model is a laser that operates at various wavelengths, typically within the range of 350 - 400 nm. The laser light is directed through a lens equipment, which is highly precise, and can provide an optical power of up to 200 mW/cm2. The reticle alignment system is used to precisely align the reticle pattern used in the photolithography process with the wafer. The exposed photoresist unit includes a dynamic scanner, which is used to apply the photoresist onto the wafer surface. This is done with a steady stream of light delivered to the wafer surface. The total amount of power delivered to the wafer can be accurately adjusted based on the desired resolution. The photoresist is then exposed to the laser light, and a chemical reaction is induced that results in the photoresist being hardened or softened in the areas exposed to light. This etched pattern is then used to pattern the wafer in a subsequent process. TOKYO ELECTRON ACT 8 is designed to be used with a precision alignment machine known as the Alaskan Series. This combination offers accuracy of up to 0.03 microns, and is capable of producing features as small as 0.07 microns. The tool also has an in-house simulator program that can be used to test wafer designs prior to the actual fabrication process. In conclusion, TEL ACT 8 is an automated, highly accurate photolithography asset for the fabrication of devices for modern semiconductor production. It utilizes a laser model to provide a range of settings for both resolution and power. Additionally, its Alaskan Series alignment equipment and in-house simulator program provide users with the flexibility to create intricate designs with extreme accuracy and precision.
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