Used TEL / TOKYO ELECTRON ACT 8 #9244352 for sale

TEL / TOKYO ELECTRON ACT 8 is a photoresist equipment designed to make materials resistant to energy sources. This system can be used to create protective and functional surfaces for various applications. The unit is composed of a high-performance, high-contrast, organic vapor phase resist cover layer, and a polymeric absorber layer. The machine is designed to be compatible with currently popular lithography techniques such as photolithography, electron beam lithography and ion beam lithography. The cover layer of TEL ACT 8 is comprised of a silicon-containing resist material that can resist various energy sources such as contact exposure, electron beam, ultraviolet light, ion beam, x-ray irradiation, etc. This cover layer is designed to have a very high selection ratio in order to achieve excellent contrast between exposed areas and unexposed areas. Also, it is formulated to be capable of undergoing surface organic and removal processes. The polymeric layer of TOKYO ELECTRON ACT 8 is composed of a polymeric resist polymer with high thermal stability. It works to protect the surface from energy sources and other environmental conditions. As it is highly sensitive to radiation exposure, it helps to create precise patterns when used with an appropriate lithography tool. TEL ACT 8 is an excellent choice for a wide variety of applications. It provides high resolution, and superior surface protection for a variety of materials that include glass, metals, and some types of polymers. Its high contrast and excellent adhesion make it ideal for areas such as circuit boards, optical components, and many other microelectronic devices. Also, it is designed to be corrosion and wear-resistant, which makes it suitable for areas subject to tough environmental conditions. With its excellent properties, it is a preferred material when it comes to high-end photoresist solutions.