Used TEL / TOKYO ELECTRON ACT 8 #9251354 for sale

TEL / TOKYO ELECTRON ACT 8 is an advanced photoresist equipment developed by TEL Limited(TOKYO ELECTRON). It is a high performance patterning system ideal for creating intricate designs with extreme accuracy. This unit is widely used in the microelectronic and semiconductor industry for fabricating complex designs for integrated circuits. TEL ACT 8 uses a high precision optical machine which uses a focused light source called a laser. This laser is used for exposing a photosensitive material called a photoresist, which can be changed through the application of light. The photosensitive resist is first applied in a thin layer to a substrate, such as a silicon wafer or circuit board. The laser is then focused onto this layer of photoresist and energy from the light source causes a chemical reaction that changes the state of the photoresist. This can either harden or soften the photoresist depending on the wavelength of the laser light used, allowing it to be patterned into a specific shape. Once the exposure process is complete, post-treatment steps such as development and etching can be used to remove the remaining photoresist from the substrate. This leaves behind a pattern of electrical contacts which can be used as part of an integrated circuit or other electronic device. TOKYO ELECTRON ACT 8 offers several benefits over other photoresist systems due to its high accuracy and reliability. Because the tool is fully automated, it ensures repeatable results with minimal operator intervention. Additionally, the asset provides excellent compatibility with the full range of photoresist materials, allowing maximum flexibility in terms of process steps. The advanced optical model used in ACT 8 also ensures that very small features can be accurately patterned on the substrate to create complex designs. This makes it an ideal choice for further device miniaturization and advanced patterning applications. In conclusion, ACT 8 photoresist equipment is an ideal choice for microelectronics and semiconductor facilities. It offers superior accuracy, compatibility with a wide range of photoresist materials, and automated operation for efficient and repeatable results.