Used TEL / TOKYO ELECTRON ACT 8 #9253993 for sale
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ID: 9253993
Wafer Size: 8"
Vintage: 2007
Coater / Developer systems, 8"
(2) AS2 Nozzles (Vertical injection type)
N2 Pressurized injection
Resist delivery: Bottle
Solvent delivery: Canister tank
Drain: 18 L
(2) Rinse lines
Includes:
AC Rack
T/H (SHINWA)
SMC INR-244-265A0300 Temperature controller
Signal connection
Does not include:
Water pump
Water lines inside
2007 vintage.
TEL / TOKYO ELECTRON ACT 8 is a photoresist equipment designed for the lithography process in the fabrication of integrated circuits and semiconductors. It is used to create patterns on wafers to generate electrical circuits. The system is based on acid catalyzed thermal oxidation (ACT) and is capable of patterning wafers with a wide range of dimensions. TEL ACT 8 unit provides a high-resolution imaging machine, which is capable of producing sub-micron features down to 0.2 micro-m. It utilizes optical source enlargement technology which helps to improve the accuracy and resolution of the patterning process. TOKYO ELECTRON ACT 8 also utilizes multiple layer processing to create complex patterns. Multiple layers of resist are applied in sequence, allowing for the creation of finer vertically separated resist layers. The tool is designed to provide excellent pattern facture, resulting in a high yield of products. The ADVACT 5 mask aligner is designed to meet the high-speed and throughput requirements of production scale lithography. It can operate on either dry or wet substrates, allowing for highly accurate photoimaging processes. It also features an automated wafer-handling asset and a UV-arresting mechanism, which helps to reduce defects in pattern imaging. The model also includes a multi-source lamp base, which supports a range of illumination sources. The lamp base is designed to provide both high contrast and high resolution, ensuring a consistently high-quality image. In short, TEL ACT 8 is an advanced photoresist equipment which offers a high-quality image and patterning process for semiconductor and integrated circuit fabrication. It features multiple layer processing, high-resolution imaging systems, automated wafer-handling, and a multi-source lamp base. The system is designed to enhance throughput and improve yield in pattern imaging.
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