Used TEL / TOKYO ELECTRON ACT 8 #9273823 for sale
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ID: 9273823
Wafer Size: 8"
Vintage: 1999
(2) Coater (2) Developer system, 8"
Single block
(3) PCH
Direction: Left to right
RRC Pump
1999 vintage.
TEL / TOKYO ELECTRON ACT 8 is a high-precision photolithography equipment for advanced semiconductor production processes. The system utilizes advanced laser photolithography to create scaled-down electronic devices and components with accurate physical dimensioning and high-level of detail. TEL ACT 8 unit provides a versatile platform for the fabrication of CMOS, BiCMOS, DMOS, and BCDMOS integrated circuits on a wide variety of materials such as silicon wafers, insulative substrates and printed circuit boards. The machine features advanced laser controllable laser hardware with excellent stability and dynamic response to handle the most challenging lithography processes. The tool uses multiple FELIX lasers operating at different wavelengths from 248 nm to356 nm for masking, positioning and exposure of various materials and device structures. It also uses a ScanCam-type laserWriter photo-mask generators for the precise structure positioning of advanced photomask patterns in fine line corridors as low as one-tenth micrometer wide. The photoresist processor of TOKYO ELECTRON ACT 8 uses high-end laser-driven scanning systems which are superior to both the x-ray and stepper lithography based approaches due to their high resolution and quick response time. The processor features advanced jet processing, pulse jet pump technology, and various cushion levels to ensure high-end processing results. In addition, ACT 8 uses a highly advanced thermal imaging technology for the accurate and repeatable Inspection and measurement of electronic devices and substrates. It also provides a user-friendly interface for material and process control, providing real-time analysis and display of image data. TEL / TOKYO ELECTRON ACT 8 is a high-end photolithography asset suited for the demanding requirements of advanced semiconductor production processes. This model helps in the rapid development of high-performance, technically complex devices, while providing a highly precise and reliable platform for the fabrication of advanced electronic products.
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