Used TEL / TOKYO ELECTRON Clean Track ACT 8 #9281143 for sale
It looks like this item has already been sold. Check similar products below or contact us and our experienced team will find it for you.
Sold
ID: 9281143
System, 8"
Main controller
Process type: DUV, Arf, Krf
Cassette block: 4-Stage
Process block: Dual block
Interface block: WEE
SHU
IRA
Spinner units:
Unit / Nozzle quantity / Pump / Nozzle type
2-1 COT / (3) / RRC
2-2 COT / (3) / RRC
3-1 DEV / (1) / H Nozzle
3-2 DEV / (1) / H Nozzle
3-3 DEV / (1) / H Nozzle
Bake units:
(8) CPL
(4) CHP
(12) LHP
(2) ADH
(4) TRS
(2) HHP
Chemical supply:
Thinner chemical supply: CCSS, (2) Buffer tanks
Dev solution supply: CCSS, (2) Buffer tanks
HMDS Chemical supply: CCSS, (2) Buffer tanks
Coat drain type: Direct drain type
Dev drain type: Direct drain type
Sub-module:
TEL AC Power box
Cup temperature / Humidity
TEL Chemical cabinet
(2) SMC Temperature Control Units (TCU)
Missing parts:
Temperature / Humidity
Oven cover
IRA Theta driver
IRA Z Driver
IRA Z Motor
1999 vintage.
TEL / TOKYO ELECTRON ACT 8 is a photoresist equipment manufactured by TEL (TOKYO ELECTRON Limited), a major electronics manufacturer based in Japan. The system is designed to be used in semiconductor fabrication facilities to fabricate wafer products with features smaller than 10nm. This unit is a "single-exposure" photoresist machine, meaning it exposes the wafer with a single dose of ultraviolet (UV) light, or "flash", making it ideal for processing smaller scale devices. TEL ACT 8 tool combines a highly stable light source, a stepper-type wafer stage, and associated optics and optics systems to accurately expose the wafer with UV light. The asset's host computer allows for managing the exposed patterning process. Using TOKYO ELECTRON ACT 8 model, multiple layers of photoresist can be used to create the desired circuit designs on the wafer. The photoresist acts as an etch mask for creating the final device, blocking certain parts of the wafer from being exposed to the etching process. The equipment automatically dispenses and bakes the photoresist before exposing it, allowing for fast processing. Once the desired patterning process is completed, the wafer is then ready for the etching process. The system typically uses a single-hatch etch, where etchant gas is used to reactive molecules in the layer being etched and create a pattern in the silicon underneath. TEL / TOKYO ELECTRON ACT 8 unit also allows for multi-hatch etching, where multiple layers of photoresist are used in order to produce smaller features and more delicate designs. The machine is highly reliable, and its light source and optics have long lifetime. Additionally, the tool uses lasers and software to ensure a highly precise and even photoresist exposure. The parallel processing capabilities of ACT 8 asset allow it to quickly process multiple layers of complicated photoresist patterns to ensure high-quality integrated circuits better than ever thought possible before. All in all, TOKYO ELECTRON ACT 8 photoresist model is a highly accurate single-exposure photoresist equipment, designed for fast fabrication of advanced integrated circuits. The system's reliable light source and optics, as well as its single-hatch and multi-hatch etching capabilities, make it an ideal choice for semiconductor fabrication facilities.
There are no reviews yet