Used TEL / TOKYO ELECTRON ACT 8 #9283788 for sale

TEL / TOKYO ELECTRON ACT 8 is a photoresist equipment, designed for photolithography in the semiconductor industry. It is a wafer stepper system that uses a resistive development process to transfer the pattern from a photomask to a silicon wafer. The unit operates by exposing a photoresist-coated wafer to light through a photomask, creating an image on the wafer. The image is then transferred from the wafer to a resistive development layer, which is used to form patterns in the photoresist layer. The machine is housed in a thermally isolated enclosure and is equipped with two heating systems, a temperature controlled wafer cooling tool, and a tailored motor control asset. It employs a high- resolution eight-inch Koehler high-resolution autofocus model to accurately pattern a semiconductor wafer. The equipment is capable of handling silicon wafers up to 8 inches in diameter and up to 4-micron imaging resolution. TEL ACT 8 takes advantage of a wide range of operating modes, including resolution enhancements, auto-exposure levels, and different image sources, allowing for fine-tuning in order to get the best possible results. It is also compatible with a wide variety of chemical materials, coating processes, and protective masks. TOKYO ELECTRON ACT 8 is controlled through an intuitive and easy to use software solution. The system also offers an array of graphical tools and interactive features to facilitate unit operation and improve results. It is designed for quick set-up and operation, and its capable of running in both manual and automatic modes. ACT 8 also offers various tracking options which include exposure maps, layer-by-layer wafer mapping, and automatic layer placement. It is designed with automated buffering which provides high-speed photoresist development with minimal loss of speed. Its auto-loader also allows for rapid loading and unloading of wafers. Overall, TOKYO ELECTRON ACT 8 is a powerful and versatile photolithography machine designed for high-speed wafer processing. It is capable of producing highly precise patterns with minimal loss of speed, offering the ideal solution for advanced lithography requirements in the semiconductor industry.