Used TEL / TOKYO ELECTRON ACT 8 #9285382 for sale

TEL / TOKYO ELECTRON ACT 8 is a photoresist equipment designed to provide cost-efficient, high performance surface treatment. The system is an automated tool for the cleaning, baking and developing of photoresist applied to a substrate. It runs using a combination of helium, nitrogen and oxygen, and can handle substrates up to 8 inches in size. TEL ACT 8 is composed of two main parts: the photoresist applicator, and the image transfer chamber. In the photoresist applicator, helium is used to apply a thin film of photoresist onto the substrate, while nitrogen is used to stabilize the photoresist before baking in the baking chamber. This is followed by a high temperature bake cycle that is controlled by a programmable logic controller (PLC). After the substrate has been coated with photoresist and baked, it is sent to the image transfer chamber. Here, a layer of photoresist is exposed to light in order to create a pattern. An exposure source is positioned over the top of the substrate and controlled in order to provide the desired pattern. Following this, the substrate is developed by a combination of air, nitrogen, and a developer. Finally, a rinse bath removes excess resist. TOKYO ELECTRON ACT 8 can be programmed to automatically adjust various parameters, including the temperature, exposure level, process time, and developer composition. This allows for a wide variety of photoresist components to be used on different substrates. Additionally, the unit includes a sophisticated control interface which allows it to be operated remotely, and be easily integrated into automated production systems. In conclusion, TEL ACT 8 is a photoresist machine that is designed to provide precision and cost effective surface treatments. It is equipped with automated features that allow for adjustment of various parameters, as well as remote control of the tool. Through the use of helium, nitrogen and oxygen, as well as a high temperature bake cycle, ACT 8 makes the cleaning, baking and developing of photoresist achievable with minimum effort.