Used TEL / TOKYO ELECTRON ACT 8 #9289040 for sale
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ID: 9289040
(4) Coater / (2) Developer system
Dual block
Right to left wafer flow
Block 1:
Type 3 controller
(16) RDS Resist pumps
Block 2:
2-1, 2-2 Standard COT:
(4) Resist nozzles
With (4) RDS resist pumps
2-3, 2-4 TCT Unit (Top ARC):
(4) Resist nozzles
With (4) RDS resist pumps
(2) Adhesion Process Stations (ADH )
(4) Chiller Plate Places (CPL)
(7) Low Temperature Hot Plate stations (LHP)
(4) High Temperature Hot Plate Process Stations (HHP)
(2) Cup Washer Holders (CWH)
Transition Stage (TRS)
Transition Chill Plate (TCP)
Block 3:
Unit / Nozzle qty / Nozzle type
3-1 DEV Unit / (1) / SH Nozzle
3-2 DEV Unit / (1) / SH Nozzle
3-3 DEV Unit / (1) / SH Nozzle
3-4 DEV Unit / (1) / SH Nozzle
(6) High Precision Hot Plates (PHP)
(8) Low Temperature Hot Plate stations (LHP)
(4) Chiller Plate Places (CPL)
Block 4:
ASML PAS 5500 DUV Stepper / Scanner
Wafer Edge Exposure (WEE)
(2) External chemical supply cabinets
(2) Thermo controller units
AC Power unit.
TEL / TOKYO ELECTRON ACT 8 is a photoresist equipment designed to deliver precise and accurate processing for high-resolution features in optoelectronics, data storage, communications, and other applications. It combines photolithography technology with an active laser control system to provide superior performance and throughput. The unit is designed to enable high accuracy and low-cost optical processes, such as precision step-and-repeat, alignment, image zooming, and other applications. The machine includes a subsystem for material handling, a controller, optics, and a laser source. The material handling subsystem moves the specimen from the input to the output tray and the controller is used to adjust the laser source and manipulate the optics. The optics subsystem includes a field lens, a deflection mirror, a focusing lens, a first-order diffraction grating, and neutral density filters that can be used to adjust the exposure dose. The laser source typically includes an argon fluoride excimer laser, an ultraviolet diode laser, or a blue diode laser. TEL ACT 8 has a throughput of up to 3,000 wafers per hour, with a minimum field size of 5 microns. It features high-speed alignment accuracy, with a repeatability of ±5 microns, along with an image zooming capability of 10 to 500×. Its hybrid alignment tool also allows users to perform both manual and automated alignment. The asset is designed to handle a wide range of substrates, including thick and thin film substrates, as well as glass and quartz. The model is also designed for easy and intuitive operation. It supports a graphical user interface (GUI) for process control with step-by-step instructions. The GUI also provides information on alignment gains, status of the process, and equipment settings. The system also includes a sensor feedback unit to monitor sample positioning to ensure optimal performance. The machine is designed to be robust and reliable, with automatic functionality such as self-diagnosis and self-correction. It also includes features such as error logging and reporting. The tool is factory-calibrated and offers low drift and good repeatability. It is capable of operation in a variety of temperatures and humidity levels. The compact design eliminates the need for extra airflow and space, and can be integrated with a variety of materials handling systems.
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