Used TEL / TOKYO ELECTRON ACT 8 #9290881 for sale

TEL / TOKYO ELECTRON ACT 8 is a photoresist equipment engineered for the production of highly precise microelectronic components. The system is a deposition tool designed to facilitate the creation of thin films of photoresist on semiconductor devices, allowing for the development of circuits and other components with unprecedented accuracy and detail. This is achieved by using a process known as "photolithography", wherein a mask composed of light and shade is projected onto a photoresist-coated substrate. Exposure to the mask causes the exposed areas of the photoresist to become "developed", resulting in the creation of the desired microelectronic structures. TEL ACT 8 unit utilizes an evanescent optics-based ArF KrF lithographic projection machine, allowing for the imaging of high-resolution patterns with extreme precision. It features a resolution of 60nm, indicating the minimum size of the features that can be accurately produced. The tool also has excellent off-axis tilts, allowing for the manufacture of a variety of geometrical shapes. The asset can support substrates up to 150mm in diameter and 6mm in thickness, providing the flexibility to handle a wide range of substrate sizes and types. The model also features advanced process control capabilities, enabling easy manipulation of photoresist profiles to achieve optimal film quality. The equipment provides real-time feedback regarding both mask and substrate characteristics, as well as being able to quickly adjust the beam's intensity and wavelength in order to reduce process variations and optimize throughput. In addition, the system is capable of automatic process optimization, which extends its application areas and enables process yield improvement. ADV also provides optional rapid-cooling systems and supports advanced process controls. It is fully scalable, allowing for the integration of several projection modules and enabling the production of multiple devices in parallel. Finally, the unit is also designed to be extremely robust and durable, providing reliable performance for a long time, which is critical for many types of industrial production. In conclusion, TOKYO ELECTRON ACT 8 is a cutting-edge photoresist machine designed for the accurate and sophisticated production of microelectronic components. It features an ArF KrF lithographic tool for cutting-edge resolution, advanced process control, the ability to process a wide range of substrates, and a highly reliable design for maximum durability and performance. With its expansive capabilities, the asset is ideal for a variety of industrial applications.