Used TEL / TOKYO ELECTRON ACT 8 #9290883 for sale

TEL / TOKYO ELECTRON ACT 8 is a high-tech photoresist equipment used for advanced photolithography with a resolution ofaccommodating sub-25 nanometer devices. The system combines high-precision capabilities from conventional lithography technology with a suite of powerful automation and robotics technologies. TEL ACT 8 features an advanced optical projection unit with a 4X point-to-point (P2P) lens to achieve top-quality processing accuracy for sub-25 nanometer devices. The machine's maskless lithography capability is among the most advanced in the industry. TOKYO ELECTRON ACT 8 includes TEL Laser Pattern Generator (LPG), which uses super-resolution alignment and laser pulses to selectively expose the target photoresist. The LPG is designed to improve resolution and overlay accuracy while reducing line width variance. The tool also features multi-field stitching, an innovative composite function that enables sub-resolution stitching (CFS) and die-to-die stitching (D2D) for large wafers. TOKYO ELECTRON ACT 8's scanner is great for critical micro-scale parts with extremely high levels of accuracy, thanks to the combination of photoresist with trusted and proven TOKYO ELECTRON steppers and masks. It has a high-resolution imaging asset with a pixel size of 1.0 microns, making it eligible to address extremely small features. The stepper uses a wafer-front-end robot (WFE) to ensure faster and reliable wafer transfer while minimizing contamination. TEL ACT 8 employs a variety of automation technologies to optimize model speed and wafer throughput. The advanced full-wafer-level robotic head (FWR) equipment enables high-speed wafer handling, while the Autostep real-time multi-field exposure delivers precise fields on the wafer simultaneously. The real-time field synthesis (RTFS) capabilities ensure accuracy and excellent overlay results. Additionally, the system has a setup time of less than 5 minutes and can be reset in a matter of seconds. Overall, ACT 8 from TEL / TOKYO ELECTRON is a powerful advanced photolithography tool that offers a great combination of features and capabilities for sub-25 nanometer device processing. It combines the latest in imaging and automation technologies to deliver a high-performance solution for photomask and wafer processing. Its fast set up and minimal maintenance requirements make it an ideal choice for production environments.