Used TEL / TOKYO ELECTRON ACT 8 #9294152 for sale

TEL / TOKYO ELECTRON ACT 8 Photoresist Equipment is a revolutionary piece of imaging technology that provides superior performance in terms of imaging accuracy and speed. It is designed to facilitate the deposition and patterning of polymeric and fluoromaterials to create a range of advanced, high-tech devices. TEL ACT 8 system is a lithography platform that utilizes advanced imaging optics technology that provides precise resolution for microelectronic applications. The unit employs a (HEBS) High Energy Beam Scanning technique to enable fast scanning of photoresist materials. This scanning technique is capable of producing sub-µm resolution patterns. Additionally, TOKYO ELECTRON ACT 8 provides high-quality imaging resolution in a wide variety of lithography materials ranging from the most demanding fluoropolymers to traditional chemicals. In addition to its impressive imaging capabilities, ACT 8 includes a compact cylindrical mask exposure machine for flexible patterning applications. This mask exposure tool includes a high-precision six-axis motor for precise mask placement and a horizontal and vertical linear-variable filter for optimal light intensity. TEL ACT 8 also offers a convenient user interface for simplified process control. Its onboard software gives the operator full control over all aspects of the photoplotting process, allowing for quick and effective troubleshooting. The operator can easily monitor all process parameters in real-time, including exposure light, scan rate, and light intensity. ACT 8 Photoresist Asset is an innovative imaging technology that allows for quick and efficient production of complex lithographic patterns with high-precision detail. Its advanced imaging optics and streamlined user interface make photoplotting easier than ever before, while its high-resolution imaging capabilities ensure superior performance in challenging lithography applications.