Used TEL / TOKYO ELECTRON ACT 8 #9296903 for sale

TEL / TOKYO ELECTRON ACT 8 is an advanced photoresist equipment used in semiconductor production. It combines two types of technologies; absolute precise beam scanning and single methyl methacrylate (MMA) as a photoresist. The advanced beam scanning technology enables the system to write patterns with nanoscale precision. The use of MMA makes it possible to produce features on a nanometer scale. Additionally, this unit efficiently processes substrate materials up to 6-inches in size. The core technology that makes TEL ACT 8 so powerful is its electron-beam writing machine. This uses an electron beam which is able to precisely convey patterns onto the substrate, making patterns as small as 2 nanometers of resolution possible. This technology is also used to shape the beam to the desired pattern size, ensuring accurate patterning. The single MMA photoresist provides an airtight coating, preventing contamination within the production environment. This keeps the microchip completely free of external matter, which can compromise the accuracy of the pattern produced. In addition, the MMA quickly develops and dries at a room temperature, allowing for a rapid turnaround. TOKYO ELECTRON ACT 8 also utilizes a heat-assisted stage for post-exposure bake processing. This ensures that any difficult substrate materials can be treated effectively, with resolutions as high as 30nm easily achievable. Further accuracy is provided through the use of signal-processing techniques, such as pulse doubling and tripling. To operate ACT 8, the user needs to use specialized software. This software is capable of rotating, aligning, and fine-tuning the pattern on the photoresist. It also supports data storage and analysis functions, allowing for the accurate detection of minute details. Ultimately, this ensures that the desired pattern can be printed with the correct precision. In conclusion, TEL ACT 8 is a powerful photoresist tool, designed for precise patterning of nano-scale semiconductor devices. Its combination of advanced beam scanning technology and single MMA photoresist results in nanometer level accuracy for all substrate materials. Additionally, the asset is controlled by sophisticated software for greater precision, while the heat-assisted stage adds a further level of accuracy.