Used TEL / TOKYO ELECTRON ACT 8 #9312218 for sale
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ID: 9312218
Coater / Developer system, 8"
System controller
(2) Chemical cabinets:
Chemical cabinet 1: HMDS, Solvent and developer
Chemical cabinet 2: PR
(2) SMC Temperature Control Unit (TCU)
AC Power box
Carrier station:
Type: Uni-cassette
4-Cassette stages, 1 pick-up
Coater unit:
(4) Dispense nozzles with temperature control line
Mini RRC pump
Rinse nozzle: EBR, Back rinse, solvent bath
Rinse system: 3 Liters (2) buffer tank systems
PR Suck back valve type: Suck-back valve
Direct drain
TARC Coater unit:
(3) Dispense nozzles with temperature control line
Mini RRC pump
Rinse nozzle: EBR, Back rinse, solvent bath
Rinse system: 3 Liters (2) buffer tank systems
PR Suck back valve type: Suck-back valve
Direct drain
Developer unit:
H Nozzle
(2) Stream nozzles for D.I W rinse
2 Points for back side rinse
Developer system: 3 Liters (2) buffer tank systems
Developer temperature control system
Direct drain
(2) Adhesion units:
Closed chamber (Built-in hot plate)
HMDS Tank with float sensor
Interface
High temperature hot plate
(14) Low temp hot plates
(7) Chill plates (CPL)
(4) Chilling Hot Plate (CHP) process station
(3) TRS Modules
TCP Module
HCP Module
Wafer Edge Exposure (WEE) Module
Wafer type: Notch, DUV type
Missing parts:
CSB motor I/O Board 2-0 PRA θ Motor driver
CSB Add on board
3-4 Panasonic motor
3-1 Out cup cylinder
3-1 Arm 1
3-1 Arm 2
PRB2 Chemical IO board
Temperature and humidity controller ((2) Cups)
2-0 PRA X Motor driver
4-0 IRA Z Motor drive
4-0 IRA UPS
WEE Theta driver
4-0 IRA Motor IO board
4-0 IRA IFB Add on board
Hard Disk Drive (HDD)
2000 vintage.
TEL / TOKYO ELECTRON ACT 8 is an industry-leading photoresist equipment developed by TEL, a Japanese company specializing in semiconductor equipment. The system, developed using advanced technology, offers users a cutting-edge, automated unit for processing wafers. The machine is notable for its high-precision and highly accurate results. It offers a superior etching process by exposing a substrate to light while maintaining a high degree of accuracy. The tool filters light to stabilise the image, reduce distortions, and improve line-width accuracy. With its high-speed process control, TEL ACT 8 is capable of handling over 300 wafers per hour. It also makes use of a built-in software asset that enables users to monitor process conditions, uncover abnormalities, and respond swiftly to changing process needs. The model is equipped with intelligent features, such as real-time data capture, which allows users to capture process data to analyze process trends and better manage production. It has a Clean Track cleaning mechanism to penetrate photoresists with cleaning solutions without causing damage to the wafers. The equipment produces high-quality, low-cost results by minimizing line-width variation and minimizing the need for aggressive descumming. It also supports sensitive applications, such as thin-film deposits. In addition, the system has automated testing and data analysis capabilities that enable users to diagnose problems and minimize downtime, freeing up production time and increasing efficiency. TOKYO ELECTRON ACT 8 delivers the industry's best photoresist unit at an affordable price point. Its precision and automation come together to provide reliable results for a variety of applications. Its versatility and flexibility allow users to tailor the machine to their specific needs in order to produce the highest quality of photoresist that meets their specific needs.
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