Used TEL / TOKYO ELECTRON ACT 8 #9315802 for sale

TEL / TOKYO ELECTRON ACT 8 is a next-generation photoresist equipment that provides precise nanometer-scale lithography and etching. It is part of a family of products designed and manufactured by TEL and its partner TOKYO ELECTRON. TEL / TOKYO ELECTRON/TOKYO TEL ACT 8 provides unprecedented levels of accuracy, speed and flexibility in lithography process control. The system consists of a main lithography unit powered by a high-performance digital media controller. The lithography unit is capable of processing a wide range of materials, including glass, polyimides, oxidized silica and other metals. It can also be used to perform critical etching processes that require high precision, such as plasma etching, reactive ion etching, and ion-beam etching. The main components of the machine includes a digital media controller, sensors, nozzles, and a variety of process instruments. The digital media controller is responsible for controlling the tool parameters, including exposure times, focusing distances, and focus points. Sensors measure the surface topography of the material so that the asset can maintain the desired exposure conditions. The nozzles are used to release small amounts of etching or photoresist materials onto the material surface, ensuring that the desired process requirements are met. The model also includes a range of energy sources and process options. This allows for the formation of structures and patterns with nanometer-level precision. The equipment uses a variety of energy sources and process options, including a pattern generator, laser scanning systems, direct laser writing, and electron beam lithography. Additionally, the system is also equipped with an integrated helium-xenon illumination unit to provide uniform illumination of the sample surface. TOKYO ELECTRON ACT 8 is an advanced, precision lithography and etching machine. It is suitable for processes such as microelectronics, optoelectronics, medical device packaging, and MEMS designs. It enables the fabrication of nanoscale structures with exceptional accuracy, speed, and flexibility. The tool's comprehensive toolset and reliable performance make it an excellent choice for high-precision lithography and etching applications.