Used TEL / TOKYO ELECTRON ACT 8 #9352785 for sale

TEL / TOKYO ELECTRON ACT 8 is a photoresist equipment designed for coating, aligning and exposing photoresists for semiconductor fabrication. This system provides a combination of high-speed operation and exceptional result reproducibility, with a flexibility so that users can customize their photoresist usage to optimize it for their specific processes. TEL ACT 8 is designed with a very high throughput capability and aligns with its two-stage robotized scan mode which is based on continuous high-speed, high-precision edge control. This streamlined approach allows for coating, aligning, and exposure at speeds up to 1000mm/sec for large substrates. The unit also features an advanced thermal control machine, which provides stable thickness and composition results even in large batch processes and is designed for aggressive operation ramps. To ensure uniform temperature range and performance, TOKYO ELECTRON ACT 8 is also designed with a multi-zone environmental control tool. This asset is able to keep the deposition and other processes operating within a narrow temperature range and to ensure the correct composition and thickness of the photoresist layer is achieved with each cycle. ACT 8 model also features an advanced vacuum equipment which helps to reduce contamination, increase exposure uniformity, and provides greater precision in image formation. The system is controlled via computer and is modularly designed to provide flexibility and to ensure efficient maintenance and unit upgrades. In summary, TOKYO ELECTRON ACT 8 is an advanced photoresist machine that offers a combination of high-speed operation and result reproducibility. The tool is designed to keep deposition and exposure within a very narrow temperature range to ensure uniformity and accuracy, and features an advanced vacuum asset to reduce contaminants and increase exposure uniformity. The computer control model is modularly designed to facilitate maintenance and updates, and provides a high level of user customizability to optimize the photoresist equipment for the specific process needs.