Used TEL / TOKYO ELECTRON ACT 8 #9407748 for sale

TEL / TOKYO ELECTRON ACT 8
ID: 9407748
(2) Coater / (2) Developer system Right to left Does not include interface block (2) Blocks: COT DEV.
TEL / TOKYO ELECTRON ACT 8 is a state-of-the-art photoresist processing solution designed to meet a wide range of requirements for production of Micro Electro Mechanical Systems (MEMS). The equipment is equipped with both spinning and belt processes, making it suitable for a variety of photoresist processing applications. It is designed to deliver superior performance, high throughput and a high level of process flexibility. TEL ACT 8 is capable of processing both photosensitive resist patterns and submicron level structures. It is specifically designed for high volume production of multi-layer MEMS devices with typical dimensions in the micro- and nano-meter range. The system is equipped with a high performance surface coating station offering processing of a wide range of substrate materials with accurate surface coating up to 18 μm thick. TOKYO ELECTRON ACT 8 is equipped with a variety of control technologies, including a multi-zone spin coater, digital inkjet printer, roll-to-roll wafer former, two-dimensional mask aligner, near-field projection microscope and an integrated process feedback loop. These technologies enable an outstanding level of process accuracy and reliability. In addition, TOKYO ELECTRON ACT 8 is also capable of performing post processing activities such as debonding, baking and baking/cooling. The versatile spin coater and wafer former stations provide outstanding results without risk of damaging the photoresist layer or the device substrate. ACT 8 unit is highly flexible and user-friendly. It has the capability to store up to 1000 user recipes, allowing customers to easily implement a variety of process changes. The machine also features a very intuitive graphical user interface (GUI) which enables users to easily navigate their way through various photoresist processing steps. In addition, its sophisticated software architecture reduces the complexity of tuning the process parameters and enables a high degree of precision. All in all, TEL / TOKYO ELECTRON ACT 8 photoresist processing tool provides high performance, high throughput and low process costs. It is an ideal solution for those looking for advanced photoresist processing technology for their MEMS production requirements.
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