Used TEL / TOKYO ELECTRON CL1300 #293607976 for sale

TEL / TOKYO ELECTRON CL1300 is a photoresist equipment designed for high accuracy, low overspray, and maximum throughput. TEL CL1300 contains a number of features that allow it to be used in a variety of semiconductor, MEMS, and hybrid fabrication applications. The system features a large-area processor capable of handling substrates up to 400mm in diameter, and available dimension lengths to accommodate substrates up to four inches in size. TOKYO ELECTRON CL1300 has the capability to process substrates with up to 5 micronics resolution, making it ideal for a wide range of fabrication and processing techniques. Further, this photoresist unit has a chamber volume of 101 liters or greater, allowing for large and complex substrates to be processed in a single setting. The photoresist machine is equipped with several safety and control features, making it a reliable and reliable tool for fabrication. CL1300 includes a PLC control asset, with touch-screen control panel, to provide accurate and repeatable process control. It also includes a motion detector to ensure the substrate remains in place during processing; anti-static shoes for operator safety; and safety barriers to keep contaminants from entering the model. TEL / TOKYO ELECTRON CL1300 is capable of spin-coating, pneumatic and Jet Spray coating, and evaporation and laser-assisted photoresist coating. This photoresist equipment uses a proprietary software system to monitor and adjust parameters during the fabrication process, allowing for a more efficient and predictable photoresist patterning. Additionally, TEL CL1300 also offers multi-zone heating and cooling systems to enable a range of photoresist patterns. In terms of maintenance, TOKYO ELECTRON CL1300 requires minimal maintenance, as it is designed with a number of features to help prevent photoresists from degrading. This includes an advanced filtration unit to reduce the presence of foreign particles and contaminants; a chemical activity scanner to ensure the photomask is free from disqualification and contamination; and a temperature control machine to minimize thermal cycling and minimize photoresist degradation. In sum, CL1300 photoresist tool is an ideal solution for a variety of fabrication and processing needs, offering high accuracy, low overspray, maximum throughput, and a range of safety and control features. It is an ideal solution for any laboratory or industrial application, as it is capable of processing large substrates with up to 5 microns resolution, and offers the accuracy and reliability necessary for success.