Used TEL / TOKYO ELECTRON Clean Track ACT 12 #293823519 for sale
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ID: 293823519
Vintage: 2015
Clean Track
(2) Coater / (0) Developer system
Power supply
Chemical box
Temperature Control Unit (TCU)
Cassette Station Block (CSB):
(3) Loads
Photoresist / Process Additive (PR/PA) Driver Type 4
Spin driver
Direct Current (DC) Boards
Process Resist Bake (PRB) Module:
(2) Coaters
No hot plate
2015 vintage.
TEL / TOKYO ELECTRON Clean Track is an integrated equipment that supports photoresist processes. The system is made up of four main components: an automated cleaning unit, an auto-positioning unit, a monitor unit, and an inspection unit with wafer mapping. The automated cleaning unit is designed to keep the chamber containing the photoresist material clean and contaminant-free. It consists of a clean chamber, a dual chamber dust collector, and a hydrocyclone dust separator. The dual chamber dust collector separates out the dust particles from the air passing through the chamber, which are then trapped in the hydrocyclone dust separator. The clean chamber is where the photoresist material is processed, and it is constantly monitored to ensure that the quality and performance of the photoresist is optimal. The auto-positioning unit makes the process of photoresist material application easy and efficient. It consists of two optical scales and two linear scales, which helps to precisely set up the required exposure points. This allows the user to accurately adjust the desired exposure on the photoresist material for a given application. The monitor machine acts as the brains of the tool. It consists of a touch panel display and an integrated computer that records the data from the automated cleaning unit, the auto-positioning unit, and the inspection unit. This data can then be analyzed in order to determine the optimum exposure timing, level and position for the photoresist material. The inspection unit with wafer mapping allows for a detailed visual inspection of the photoresist material. It consists of a high-resolution imaging camera and a powerful illumination asset. This allows for a clear and detailed examination of the photoresist material's surface characteristics, such as defects, particle size, and structural uniformity. The wafer mapping also helps to locate any areas of stress or distortion, which can then be used to correct any deficiencies in the photoresist material. TEL Clean Track is an efficient and reliable model that makes the photoresist process easier and more efficient. Its automated cleaning unit and auto-positioning unit helps to precisely and accurately apply the photoresist material, while its monitor equipment and inspection unit allows for detailed analysis and visual inspections to ensure that the photoresist material is of the highest quality.
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