Used TEL / TOKYO ELECTRON Clean Track ACT 12 #9138480 for sale

TEL / TOKYO ELECTRON Clean Track ACT 12
ID: 9138480
Wafer Size: 12"
Coater / (2) Developers system, 12" Single block IFB.
TEL / TOKYO ELECTRON Clean Track ACT 12 is an advanced photoresist equipment that is designed for very high cleaning and etching applications in the semiconductor industry. The system is designed to provide precise control over the photoresist etching process, allowing it to achieve desired results while minimizing waste. TEL Clean Track ACT 12 uses a combination of photoresist spraying, etching, and bake properties to produce ultra-fine, high-precision etched patterns on materials of varying size and thickness. Photoresist is a light sensitive polymer used in the lithographic process to create tiny features on silicon wafers. TOKYO ELECTRON Clean Track ACT 12 utilizes an advanced ultra-fast UHF solid-state laser to spray photoresist on the wafer. This feature ensures that the pattern does not become distorted due to aggressive thermal conditions commonly found in other systems. Clean Track ACT 12 also includes a high-speed etching unit managed by precise laser and electric controls. This machine is capable of accurately etching complex patterns with a repeat accuracy of up to 0.5μm. Etching is used to create the desired pattern on the wafer surface, which is then coated with a photoresist that is sensitive to ultra-violet light. The UV light is used to selectively etch the desired pattern on the photoresist. Finally, after etching, the wafer is subjected to a bake cycle. This process is done to further strengthen the accuracy of the patterns and to remove any remaining photoresist on the substrate surface. TEL / TOKYO ELECTRON Clean Track ACT 12 is designed to monitor the thermal characteristics of the bake process so that the result is accurate and repeatable. In conclusion, TEL Clean Track ACT 12 is an advanced photoresist tool that is designed specifically for high-performance, very high-precision etching and cleaning applications within the semiconductor industry. It utilizes a combination of photo-resist spraying, etching, and bake properties to produce ultra-fine features on substrates of varying sizes and thicknesses. With a repeat accuracy of up to 0.5 μm, TOKYO ELECTRON Clean Track ACT 12 is capable of producing extremely high quality results with minimal waste.
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