Used TEL / TOKYO ELECTRON Clean Track ACT 12 #9138481 for sale

TEL / TOKYO ELECTRON Clean Track ACT 12
ID: 9138481
Wafer Size: 12"
(2) Coaters / (2) Developers system, 12" IFB Single block.
TEL / TOKYO ELECTRON Clean Track ACT 12 is a revolutionary photoresist equipment designed for the processing of integrated circuits and applications requiring a high level of precision. TEL Clean Track ACT 12 system consists of a chemical pre-treatment module, a high-powered washing unit that removes solid particles, and a patented photosensitive film developed to maximize image clarity. The chemical pre-treatment module is designed to neutralize any contaminate residue that may be present on the substrate, and to create a homogeneous base for the deposition of the photoresist. The high-powered washing machine is designed to accurately remove any solid particles from the surface of the substrate, as well as any particulate that may have been inadvertently absorbed by the film. The patented photosensitive film used in TOKYO ELECTRON Clean Track ACT 12 is a unique deposition that has been developed in conjunction with the Japanese research institute, RIKEN. The film maximizes the resolution of the image and allows for greater precision during etching and lithography processes. Clean Track ACT 12 has several features that enable it to perform at the highest level of precision. The cleaning technology used in the tool eliminates particles and particulate which can result in degraded image clarity. The advanced photoresist asset is designed to enable the circuit designer to quickly move from concept to realization with minimal alteration to the original design. This model utilizes a high-power heating element to quickly and uniformly cure the photoresist, allowing for faster and more accurate applications. The ability to continuously etch feature sizes of 0.18 microns and below is a key advantage offered by TEL / TOKYO ELECTRON Clean Track ACT 12. This high fidelity equipment offers improved transistor and resistor densities for increased circuit densities. The small but highly accurate features produced by this system are particularly well suited for applications that require near atomic level precision. In addition, TEL Clean Track ACT 12 is compatible with a host of etching and lithography techniques. TOKYO ELECTRON Clean Track ACT 12 is an exceptional photoresist unit that enables the fabrication of complex circuits with up to the highest level of precision. The unique combination of the advanced cleaning technology, highly accurate photoresist films and powerful heaters, enables rapid prototyping and faster time to market. Clean Track ACT 12 is a remarkably advanced photoresist machine designed to meet an ever-increasing demand for quality and precision in the fabrication of advanced integrated circuits.
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