Used TEL / TOKYO ELECTRON Clean Track ACT 12 #9216089 for sale

ID: 9216089
Wafer Size: 12"
Vintage: 2008
Coater / (2) Developer system, 12" With system controller Left to right I/F Wafer stage type: NIKON Type (SFl3) Carrier station: Foup cassette Uni-cassette (3) Cassettes Coater unit: (6) Dispense nozzles with temperature controlled lines MILLIPORE RDS Pump Rinse nozzle: Back / EBR / Solvent bath Rinse system: 3 Liters (2) buffer tanks Degassing system Programmable side rinse: PR Nozzles (1-6): (36) Bottles Thinner supply (Bottle / Nozzle): CCSS AMC Suck-back valve Direct drain Developer unit: H-Nozzle Stream nozzle for DI rinse Developer system: (2) 3 Liters buffer tanks Developer supply: CCSS Degassing system Developer temperature control system Direct drain Adhesion unit: Sealing closed chamber HMDS Tank with float sensor HMDS Supply: Local bottle (5) Low temperature hot plates (LHP) (4) Chill plates (CPL) (4) Precision chilling hot plates (CHP) TCP Unit (2) TRS Units WEE Unit (Wafer edge exposure) UV Sensor: I-line Chemical cabinet: Solvent HMDS DEV Chemical cabinet SHINWA ESA-8 Series Temperature / Humidity controller Temperature Control Unit (TCU) AC Power box 2008 vintage.
TEL / TOKYO ELECTRON Clean Track ACT 12 is a photoresist equipment that is used in semiconductor fabrication. It consists of a photoresist processing system and a stepper track combined in one integrated unit to provide a low-particulate environment. The photoresist unit is the first step in semiconductor device fabrication and is used to create small patterns on the substrate. The photoresist is exposed to light, either from a photomask or a beam of electrons, depending on the pattern being created. The exposed photoresist is then developed and the resulting pattern is transferred to the substrate. TEL Clean Track ACT 12 is designed to be as efficient, clean, and low-particulate as possible. This is achieved through its advanced stepper track machine, which works in conjunction with the photoresist processing tool. The stepper-track asset is designed to reduce the number of particles created by the photomask during the exposure process. It does this by capturing the particles and isolating them between the track and the photomask during the processing. The particles are then safely removed and disposed of. TOKYO ELECTRON Clean Track ACT 12 also features an advanced temperature tracking model that can directly enforce temperature control by correlating electron beam temperatures with process times and dose. This reduces the chances of defects caused by changes in temperature during processing. Clean Track ACT 12 is an invaluable tool in the rapidly growing field of semiconductor fabrication. Its combination of advanced photoresist processing, stepper-track equipment, and temperature tracking capabilities provide precise results in a low-particulate environment. It is becoming increasingly popular amongst device manufacturers due to its efficiency and effectiveness.
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