Used TEL / TOKYO ELECTRON Clean Track ACT 12 #9216089 for sale
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ID: 9216089
Wafer Size: 12"
Vintage: 2008
Coater / (2) Developer system, 12"
With system controller
Left to right
I/F Wafer stage type: NIKON Type (SFl3)
Carrier station:
Foup cassette
Uni-cassette
(3) Cassettes
Coater unit:
(6) Dispense nozzles with temperature controlled lines
MILLIPORE RDS Pump
Rinse nozzle: Back / EBR / Solvent bath
Rinse system: 3 Liters (2) buffer tanks
Degassing system
Programmable side rinse:
PR Nozzles (1-6): (36) Bottles
Thinner supply (Bottle / Nozzle): CCSS
AMC Suck-back valve
Direct drain
Developer unit:
H-Nozzle
Stream nozzle for DI rinse
Developer system:
(2) 3 Liters buffer tanks
Developer supply: CCSS
Degassing system
Developer temperature control system
Direct drain
Adhesion unit:
Sealing closed chamber
HMDS Tank with float sensor
HMDS Supply: Local bottle
(5) Low temperature hot plates (LHP)
(4) Chill plates (CPL)
(4) Precision chilling hot plates (CHP)
TCP Unit
(2) TRS Units
WEE Unit (Wafer edge exposure)
UV Sensor: I-line
Chemical cabinet:
Solvent
HMDS
DEV Chemical cabinet
SHINWA ESA-8 Series Temperature / Humidity controller
Temperature Control Unit (TCU)
AC Power box
2008 vintage.
TEL / TOKYO ELECTRON Clean Track ACT 12 is a photoresist equipment that is used in semiconductor fabrication. It consists of a photoresist processing system and a stepper track combined in one integrated unit to provide a low-particulate environment. The photoresist unit is the first step in semiconductor device fabrication and is used to create small patterns on the substrate. The photoresist is exposed to light, either from a photomask or a beam of electrons, depending on the pattern being created. The exposed photoresist is then developed and the resulting pattern is transferred to the substrate. TEL Clean Track ACT 12 is designed to be as efficient, clean, and low-particulate as possible. This is achieved through its advanced stepper track machine, which works in conjunction with the photoresist processing tool. The stepper-track asset is designed to reduce the number of particles created by the photomask during the exposure process. It does this by capturing the particles and isolating them between the track and the photomask during the processing. The particles are then safely removed and disposed of. TOKYO ELECTRON Clean Track ACT 12 also features an advanced temperature tracking model that can directly enforce temperature control by correlating electron beam temperatures with process times and dose. This reduces the chances of defects caused by changes in temperature during processing. Clean Track ACT 12 is an invaluable tool in the rapidly growing field of semiconductor fabrication. Its combination of advanced photoresist processing, stepper-track equipment, and temperature tracking capabilities provide precise results in a low-particulate environment. It is becoming increasingly popular amongst device manufacturers due to its efficiency and effectiveness.
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