Used TEL / TOKYO ELECTRON Clean Track ACT 12 #9216090 for sale

TEL / TOKYO ELECTRON Clean Track ACT 12
ID: 9216090
Wafer Size: 12"
Vintage: 2004
Coater / (2) Developer system, 12" Left to right Main frame with controller Carrier station type: Foup cassette Uni-cassette (3) Cassettes Coater unit: (6) Dispense nozzles with temperature controlled lines MILLIPORE RDS Pump Rinse nozzle: Back / EBR / Solvent bath Rinse system: 3 Liters (2) buffer tanks Degassing system Programmable side rinse: PR Nozzles (1-6): (36) Bottles (Bottle / Nozzle) Thinner supply: CCSS AMC Suck-back valve Direct drain Developer unit: H-Nozzle DI Rinse: Stream nozzle Developer system: 3 Liters (2) buffer tanks Developer supply: CCSS Degassing system Developer temperature control system Direct drain I/F Wafer stage type: NIKON Type (SFl3) Adhesion unit Sealing closed chamber HMDS Tank with float sensor HMDS Supply: Local bottle (5) Low temperature Hot Plates (LHP) (4) Chill plates (CPL) (4) Precision Chilling Hot Plates (CHP) TCP Unit (2) TRS Units Wafer Edge Exposure Unit (WEE) I-Line UV sensor Chemical cabinet: Solvent HMDS Developer chemical cabinet SHINWA ESA-8 Series Temperature / Humidity controller Temperature Control Unit (TCU) AC Power box 2004 vintage.
TEL / TOKYO ELECTRON Clean Track ACT 12 is an advanced photoresist processing equipment designed for use in semiconductor microfabrication. This system utilizes liquid replenishment, immersion, and contactless scanning technology to deliver precise resist and particle-free results for advanced semiconductor processes. The unit consists of a scanner assembly, multiple dispensers, recirculating washer, and a productivity software package. The scanner assembly provides precise control of resist dose and uniformity with high-resolution contactless scanning. Dispensers provide the cleaning solutions and resist needed for the machine. The recirculating washer allows for continuous liquid replenishment, removing particles and other matter which may contaminate the tool resulting in resist residue. Lastly, the productivity software gives real-time asset performance feedback and performance verification for model optimization. The equipment is designed with a low-maintenance environment in mind; the proximity of the dispensers, recirculating washer and scanner allow for minimal servicing and optimum performance. This system is also capable of large-area processing of up to 456 millimetres at a 20 micron resolution—essential for advanced semiconductor process steps. Additionally, down-time of the unit is minimized due to the quick recovery process following over-dosed solution, thus providing consistent result for each lot. The ACT 12 photoresist machine is designed to keep up with advanced semiconductor processing. Utilizing its contactless scanning capability, liquid replenishment, and LED-replenishment technologies, this tool is capable of providing particle-free results with high-precision resist doseability. This asset is designed to provide the best substrate/resist performance for next-generation microfabrication processes.
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