Used TEL / TOKYO ELECTRON Clean Track ACT 12 #9216090 for sale
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ID: 9216090
Wafer Size: 12"
Vintage: 2004
Coater / (2) Developer system, 12"
Left to right
Main frame with controller
Carrier station type:
Foup cassette
Uni-cassette
(3) Cassettes
Coater unit:
(6) Dispense nozzles with temperature controlled lines
MILLIPORE RDS Pump
Rinse nozzle: Back / EBR / Solvent bath
Rinse system:
3 Liters (2) buffer tanks
Degassing system
Programmable side rinse:
PR Nozzles (1-6): (36) Bottles
(Bottle / Nozzle) Thinner supply: CCSS
AMC Suck-back valve
Direct drain
Developer unit:
H-Nozzle
DI Rinse: Stream nozzle
Developer system:
3 Liters (2) buffer tanks
Developer supply: CCSS
Degassing system
Developer temperature control system
Direct drain
I/F Wafer stage type: NIKON Type (SFl3)
Adhesion unit
Sealing closed chamber
HMDS Tank with float sensor
HMDS Supply: Local bottle
(5) Low temperature Hot Plates (LHP)
(4) Chill plates (CPL)
(4) Precision Chilling Hot Plates (CHP)
TCP Unit
(2) TRS Units
Wafer Edge Exposure Unit (WEE)
I-Line UV sensor
Chemical cabinet:
Solvent
HMDS
Developer chemical cabinet
SHINWA ESA-8 Series Temperature / Humidity controller
Temperature Control Unit (TCU)
AC Power box
2004 vintage.
TEL / TOKYO ELECTRON Clean Track ACT 12 is an advanced photoresist processing equipment designed for use in semiconductor microfabrication. This system utilizes liquid replenishment, immersion, and contactless scanning technology to deliver precise resist and particle-free results for advanced semiconductor processes. The unit consists of a scanner assembly, multiple dispensers, recirculating washer, and a productivity software package. The scanner assembly provides precise control of resist dose and uniformity with high-resolution contactless scanning. Dispensers provide the cleaning solutions and resist needed for the machine. The recirculating washer allows for continuous liquid replenishment, removing particles and other matter which may contaminate the tool resulting in resist residue. Lastly, the productivity software gives real-time asset performance feedback and performance verification for model optimization. The equipment is designed with a low-maintenance environment in mind; the proximity of the dispensers, recirculating washer and scanner allow for minimal servicing and optimum performance. This system is also capable of large-area processing of up to 456 millimetres at a 20 micron resolution—essential for advanced semiconductor process steps. Additionally, down-time of the unit is minimized due to the quick recovery process following over-dosed solution, thus providing consistent result for each lot. The ACT 12 photoresist machine is designed to keep up with advanced semiconductor processing. Utilizing its contactless scanning capability, liquid replenishment, and LED-replenishment technologies, this tool is capable of providing particle-free results with high-precision resist doseability. This asset is designed to provide the best substrate/resist performance for next-generation microfabrication processes.
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