Used TEL / TOKYO ELECTRON Clean Track ACT 12 #9239542 for sale

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ID: 9239542
Wafer Size: 12"
Vintage: 2005
SOG System, 12" Process block: Single block system Hard Disk Drive (HDD) CSB: Equipment controller Stage / Indexer: (4) Foup indexers CRA / Cassette block robotics arm PRB: SOD Unit 2-1: (2) Resist dispense nozzles Side rinse nozzle (Programmable side rinse EBR) Coat cup temperature synchronized control system Photoresist temperature control Motor flange temperature control Photo resist drain type: Direct gravity drain type Cup type: PP for upper cup & inner cup SOD Unit 2-2: (2) Resist dispense nozzles Side rinse nozzle (Programmable side rinse EBR) Coat cup temperature synchronized control system Photoresist temperature control Motor flange temperature control Photo resist drain type: Direct gravity drain type Cup type: PP for upper cup & inner cup PRA / Process Block Robotics Arm (6) LHP / Low Temperature Hot Plate Stations (4) CPL / Chilling Plate Process Stations TRS / TCP: Transition Stage Unit CWH / Cup Washer Holder Unit External chemical supply system: Solvent supply system for (2) SOD units Solvent chemical type Canister tank to auto supply system with (2) PCS pump tanks Tank type: (2) Pump tanks (3 Liters/Tank, Teflon) to cover (2) coat units TEL OEM TCU / Temperature control unit: SMC Circulator pumps and thermo controller Power transformer AC cabinet: 208 VAC, 3-Phase, 50/60 Hz 2005 vintage.
TEL / TOKYO ELECTRON Clean Track ACT 12 is an advanced photoresist tool equipment designed to achieve high performance standards for production and engineering process applications in the modern semiconductor manufacturing makeup. The system features a unique combination of hardware and software components, all of which work together to deliver a highly efficient and precise photoresist processing solution. At its core lies a multi-chamber unit that incorporates a number of state-of-the-art components including a high-performance software platform that is designed to ensure user-friendly operation. This platform ensures reliable results, intuitive controls, and a rapid processing that helps to maximize efficiency. Furthermore, the machine itself offers a number of features and functions that allow for maximum versatility and customizability to meet the needs of a variety of process requirements. The heart of the tool lies within its multi-chamber chamber design, whereby each chamber supports an independent process that is completely isolated from the others. This enables users to customize the process parameters and control level of photoresist processing for each operation. Furthermore, the multiple media accelerator chambers use ultra-precision control of the injection pump to ensure consistent, accurate, and precise dispersion of the photoresist material. The asset is built on a platform that intelligently integrates various user functions, such as model-level process insights, to facilitate increased accuracy and speed in photoresist processing times. This ensures a highly reliable process for all operations. Furthermore, the equipment is designed to maximize process throughput and productivity, through easy to use data acquisition functions and a fully integrated statistical analysis package. Finally, TEL Clean Track ACT 12 is built around a robust safety system that has been designed to significantly decrease the risk of incorrect material input and minimize loss due to contamination. This safeguards the process integrity and product quality of all photoresist processing throughout the entire unit. In conclusion, TOKYO ELECTRON Clean Track ACT 12 is a highly capable photoresist tool machine that provides users with advanced hardware and software components, all of which are designed to deliver a high-performance, reliable, and reliable photoresist processing tool. The asset is built around a customizable multi-chamber model with user friendly controls, a rapid processing throughput, intuitive data acquisition and statistical analysis tools, as well as a robust safety equipment that helps reduce the risk of contamination. All these attributes work together to ensure maximum accuracy and efficiency in all photoresist related processes.
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