Used TEL / TOKYO ELECTRON Clean Track ACT 12 #9244064 for sale

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ID: 9244064
Wafer Size: 12"
Vintage: 2008
Resist coater / Developer system, 12" Single block Track 1: Coater cup (2) Developer cups ADH Track 2: Resist reduction: RRC Developer: H Nozzle Resist pump: RDS 10 ml Oven configuration: PEB: (2) PHP COT: (2) PHP Post bake: (3) CHP Track chemicals: Resist supply: Gallon bottle Thinner: OK73 2008 vintage.
TEL / TOKYO ELECTRON Clean Track ACT 12 is a photoresist development equipment used in the semiconductor manufacturing process. The system is designed to assist in the production of highly precise and optimized electronic components. It is a sophisticated technological solution that allows for the creation of patterns with repeatable results and improved uniformity. The ACT 12 functions by reacting to light irradiated onto a photosensitive resist material. This process is known as photolithography and it is used to create detailed patterns on the resist material. Once in place, the resist material is developed, which then forms the device's pattern. The unit utilizes a unique combination of Exposure Laser and Particle Lifting technologies to produce superior results. The ACT 12 features a cluster unit comprised of four individual systems which employ three different light source options: an excimer laser (266nm), krypton fluoride (248nm), and argon fluoride (193nm). It also features a dedicated control machine, with a CPU for data management, to ensure each light source can be utilized for optimal performance. The tool's Exposure Laser enables superior printing resolution, with geometrical accuracy and uniformity. The Particle Lifting function helps ensure that the warped corners of the resist material are shaved before development. This promotes better corner resolution and alignment of the tight patterns. The ACT 12 is the standard model in the Clean Track series and is capable of carrying out development processes with 90second cycle times. It also provides higher throughput with processing speeds of up to 5.7cm/second. The asset is constructed with an ultra-clean stainless steel vacuum chamber for dirt free production, and is equipped with a removable, adjustable stage for quick and easy installation of substrates. In summary, TEL Clean Track ACT 12 is a state-of-the-art photoresist development model which is designed for accuracy and reliability. It offers superior printing resolution with fast cycle times and high throughputs. The equipment is capable of producing highly precise and uniform patterns with repeatable results, and is constructed with an ultra-clean stainless steel vacuum chamber to support dirt free production.
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