Used TEL / TOKYO ELECTRON Clean Track ACT 12 #9245699 for sale

TEL / TOKYO ELECTRON Clean Track ACT 12 is a photoresist equipment designed specifically for the integrated circuit (IC) foundry market. The system combines mask aligner and partial coater technologies in a single platform to provide a cost-effective and efficient solution for the photolithography processes in IC fabrication. The mask aligner technology is used to precisely align the photomask to the wafer, ensuring highly accurate exposure of photoresist onto the semiconductor material. The partial coater technology allows for selective coating of photoresist, enabling efficient patterning on IC features with very small lateral dimensions. TEL Clean Track ACT 12 features a sophisticated substrate handling unit that delivers optimal performance and reliability. The machine supports wafers up to 300 mm in diameter, and can expose wafers at speeds up to 600 wafers per hour. The tool also features an advanced temperature-controlled exposure stage that ensures precise and consistent exposure times, regardless of ambient lighting or temperature fluctuations. In addition to its exposure capability, TOKYO ELECTRON Clean Track ACT 12 also features innovative chemical processes designed to reduce particle contamination and improve chip yield. The asset utilizes a patented, dry-etch technology that etches photoresist into the unique patterns required for the IC fabrication process. This dry-etch technology has been proven to reduce particle buildup, resulting in higher chip yields and fewer rejected wafers. Clean Track ACT 12 also features a proprietary Automated Particle Counting Model (APCS). This equipment enables operators to monitor the particle count inside the machine during operation, allowing for adjustments to be made to reduce particle contamination and improve chip yields. Overall, TEL / TOKYO ELECTRON Clean Track ACT 12 provides a reliable and cost-effective solution for IC fabrication. The system combines advanced mask aligner and partial coater technologies to provide highly accurate exposure of photoresist, while also utilizing innovative chemical processes to reduce particle contamination and improve chip yield. The sophisticated substrate handling unit and Automated Particle Counting Machine further help to ensure reliability and quality of results.