Used TEL / TOKYO ELECTRON Clean Track ACT 12 #9266471 for sale
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ID: 9266471
Wafer Size: 12"
Vintage: 2008
(1) Coater / (2) Developer system, 12"
2008 vintage.
TEL / TOKYO ELECTRON Clean Track ACT 12 is a photoresist equipment designed for superior semiconductor device processing and manufacturing. It is a high-end equipment which offers advanced photo resist technologies and processes in a fully automated, cost-effective, and reliable package. The system is comprised of main components including a laser scanner unit with an integrated laser optics and a recyclable vacuum chuck table. The laser scanner unit allows precise beam alignment and repeatability in respects to mask data within the field of view while the vacuum chuck table allows reliable substrate coating, radiation expansion control, and eliminates potential defects such as particle dispersions. TEL Clean Track ACT 12 is equipped with several advanced features that improve performance, reduce costs, and simplify maintenance including a rapid thermal exposure and rapid thermal development (RTED) unit. This machine provides a substantial decrease in material consumption and process time by eliminating non-essential exposure components, and co-aligning the substrate exposure with the material exposure. The tool also comes with a high-power ultra-violet laser which allows for rapid exposure of larger dimensions and higher densities of patterns. Additionally, it supports a high-precision substrate alignment asset for accurate positioning, an edge exposure multiple reflection model for improved pattern uniformity, and a rinse-and-spray cassette cleaner for process variability prevention. Furthermore, TOKYO ELECTRON Clean Track ACT 12 is equipped with a full automation equipment, which is capable of handling multiple wafer sizes, as well as a reduced-diameter substrate field of heel effect system. With its recipes, the unit provides a high level of process uniformity, by compensating for particle dispersion and laser wavering. Overall, Clean Track ACT 12 is an advanced photoresist machine designed to meet the needs of the most demanding semiconductor device applications. Its features and reliability make it suitable for maximizing production throughput in a cost-effective and reliable fashion. Furthermore, the tool provides a high level of process uniformity and performance, and its full-automation asset provides a simplified and efficient working software.
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