Used TEL / TOKYO ELECTRON Clean Track ACT 12 #9266472 for sale

TEL / TOKYO ELECTRON Clean Track ACT 12
ID: 9266472
Wafer Size: 12"
Vintage: 2004
(1) Coater / (2) Developer system, 12" 2004 vintage.
TEL / TOKYO ELECTRON Clean Track ACT 12 is a state-of-the-art photoresist equipment. The system is used to deposit a photo-sensitive film onto a semiconductor surface. This allows for the precise control and manipulation of the film's thicknesses and surface properties. TEL Clean Track ACT 12 unit utilizes a precision linear stage along with a fully integrated vision/alignment machine. This allows for precise movement and accurate location of the film to be deposited. The vision/alignment tool also provides feedback to maintain the precision of the deposition process. The film is deposited through a series of spin and spray heads. The spin head spins a substrate at high speed while a spray nozzle applies the photoresist liquid onto the substrate surface. After the liquid has been applied, a vacuum chuck is used to secure the substrate, allowing for the image alignment process to begin. The stage can precisely move the substrate in either the X or Y axes. At this point the photosensitive film is aligned to the substrate and the image can be accurately reproduced onto the film. The image created on the substrate is then dried by a flash lamp before being exposed to ultraviolet light and developed. This photolithography process allows for the precise transfer of a pattern design onto the substrate. The asset also allows for thickness variations in the photoresist layer which allow for precise and accurate circuit design. Once the photoresist is developed and patterned, the substrate is then placed in the etched process, which uses various chemicals and acids to remove the photoresist and form the desired circuits on the substrate surface. TOKYO ELECTRON Clean Track ACT 12 model provides reliable and precise photolithography and etching processes, making it perfect for high volume application processes. The equipment is easy to use, and is simple to maintain. Additionally, the system is FOUP and pod trackable, making it perfect for the current wafer fabrication industry.
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