Used TEL / TOKYO ELECTRON Clean Track ACT 12 #9276181 for sale

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ID: 9276181
Wafer Size: 12"
Vintage: 2004
(2) Coat / (2) Developer system, 12" Direction: Left to right System power rating: AC, 208 V, 3 Phase Loading configuration: (3) FOUP Main system Coater unit (2-1, 2-2 Module): RDS Pump Resist supply: Gallon bottle DEV unit (2-3, 2-4 Module): Developing nozzle: SH ADH Unit: (2) CWH (2) CHP (4) PHP (2) CPL (2) TRS 2004 vintage.
TEL / TOKYO ELECTRON Clean Track ACT 12 is a photoresist equipment developed by TEL, which has been designed to provide high-level chemical cleanliness for the semiconductor industry. The system is composed of two stages; the first stage is a pre-coat, which is specially designed to pre-treat the surface of the wafer and to reduce process killer contamination. This pre-coat is then followed by a second stage, which involves a chemical clean that is specifically designed to remove any unwanted contaminants from the wafer surface. TEL Clean Track ACT 12 unit offers excellent chemical cleanliness and superior image quality, helping to ensure the highest possible production yields. The machine operates by first using a pre-coat on the wafer surface in order to remove any contaminants and ensure cleanliness. This is done by releasing a specially designed fluid solution onto the wafer. As the fluid is sprayed onto the wafer, it works to reduce particles and other unwanted debris from the surface. This allows for the chemical clean to then take place more efficiently. Once the pre-coat has been applied, the second stage of the tool is initiated. This stage involves a chemical clean that is designed to remove any additional contaminants and other unwanted substances. To begin this process, a highly concentrated chemical mixture is applied to the wafer surface. This mixture will be then exposed to ultraviolet light, as well as a asset of hot-plates which help to heat the wafer surface. These two components then work together to effectively clean the wafer surface and further eliminate unwanted particles. Finally, once the wafer has been cleaned, a post-coat is added in order to help resist any further foreign contaminants. This post-coat provides a smooth surface and helps to further protect the wafer from particles and other unwanted elements. The result is a clean and highly efficient surface that can be used for a variety of different products and projects. TOKYO ELECTRON Clean Track ACT 12 model is highly regarded in the semiconductor industry for its superior quality of chemical cleanliness and image quality. It helps to eliminate the need for manual cleaning and provides superior production yields. It's an essential tool for the semiconductor industry and for customers who require the highest level of cleanliness and efficiency.
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