Used TEL / TOKYO ELECTRON Clean Track ACT 12 #9280162 for sale
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ID: 9280162
Coater / (2) Developer system, 12"
CSB
PRB1
IFB
Chemical box
Thermo controller
(2) Fire system boxes
Left to right
Carrier type: FOUP
Loading configuration: 3 FOUP's
(3) Main controllers
Main system:
Main frame with system controller
Carrier station:
Type: FOUP Cassette
(3) Cassettes
Unicassette system
Coater unit:
(6) Dispense nozzles with temperature controlled lines
RDS Pump
Rinse nozzle: Back / EBR / Solvent bath
Rinse system: (2) Buffer tank systems (3 Liters)
Degassing system
Programmable side rinse:
(1-6) PR Nozzles
(6) Bottles (1 Bottle / 1 Nozzle)
CCSS Thinner supply
AMC Suck-back valve
Direct drain
I/F Wafer stage type: NIKON SF130
Chemical cabinet: Solvent, HMDS, DEV
Developer unit:
H-Nozzle
Stream nozzle for DI rinse
2-Points for back side rinse
Developer system: (2) Buffer tank systems (3 Liters)
Degassing system
Developer temperature control system
Direct drain
Adhesion units (ADH):
100% Sealing closed chamber (Built-in hot plate)
HMDS Tank with float sensor
Local HMDS supply
(5) Low Temperature Hot Plates (LHP)
(4) Chill Plates (CPL)
(2) Precision Chilling Hot Plates (PHP)
(2) TRS
Transfer Chill Plate (TCP)
Wafer Edge Exposure (WEE):
UV Sensor: i-Line
SHINWA Series ESA-8 Temperature and humidity controller
Temperature Control Unit (TCU)
AC Power box
2004 vintage.
TEL / TOKYO ELECTRON Clean Track ACT 12 is a state-of-the-art photoresist equipment designed to help users produce clean, high resolution patterns on a variety of substrates. Photoresist is a type of material that is sensitive to light and is used in many industrial applications, such as integrated circuit manufacturing, to create electrical connections and structures on a substrate. The ACT 12 uses a combination of focus, illumination, and stage control systems to produce patterns in a resolution range of up to 12 microns. The main component of the ACT 12 system is the high-resolution optical microscope. It is capable of more precise imaging than conventional optical microscopes, and also offers a larger field of view. A special illumination unit then provides accurate illumination for patterning processes, allowing up to 30 stages of process control when used in conjuction with a dedicated stage controller. This combination of components allows for precise patterning of miniature circuit elements on a variety of substrates, with resolutions of up to 12 microns. In addition to the optical microscope and illumination machine, the ACT 12 also has an integrated photoresist control tool. This asset helps to accurately adjust the various parameters of the photoresist model for optimum performance. Also included with the ACT 12 is a corrosion-resistant stainless steel bowl, which is ideal for mounting substrates prior to the photoresist application process. Another notable feature of the ACT 12 equipment is its ability to operate in a wide range of environmental conditions. With its corrosion-resistant construction, the system is suitable for use in humid or corrosive environments, as well as extreme temperatures. This is particularly beneficial when producing structures on substrates in sensitive or hazardous locations. TEL Clean Track ACT 12 is a state-of-the-art photoresist unit that offers precise control of parameters for patterning miniature circuit elements on a variety of substrates. With its optical microscope, illuminated stages, and integrated photoresist control machine, the ACT 12 produces clean, high resolution patterns in a resolution range of up to 12 microns. Additionally, it is rugged enough to operate in a variety of hazardous environments.
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