Used TEL / TOKYO ELECTRON Clean Track ACT 12 #9378136 for sale

TEL / TOKYO ELECTRON Clean Track ACT 12 is a photoresist processing equipment which fills the need for advanced lithography processes within the semiconductor industry. Photoresist is the light sensitive film used to create intricate patterns and features on integrated circuit (ICs) wafers. The system incorporates a highly accurate substrate stage for precise positioning of the wafer and a highly effective force-displacement sensing unit to ensure exact resist thickness during exposure. The machine is designed to contribute deep, high contrast, low-reflection, large-area and high-aspect ratio features on the wafer for a variety of applications. To achieve its high performance, the tool utilizes several advanced tools and features. Firstly, it incorporates a high-powered, laser-based optical exposure asset, achieving sub-micron accuracy. The exposure model also provides a low-reflection hard mask technology and dry-etch process to enable a high-precision dry-etching of photoresist. Furthermore, the equipment is energy efficient with the adoption of a high-efficiency, direct-laser-beam exposure system which reduces photoresist exposure costs significantly. Additionally, the unit is designed to enable a variety of operations to be performed directly in-situ while the wafer is in the machine, guaranteeing a minimized environmental footprint. For example, advanced patterning processes such as sidewall patterning, lift off patterning, and braze patterning can be done without wafer manipulation. Furthermore, the tool takes advantage of a high resolution imaging asset to enable optical character recognition (OCR), wafer mapping, and defect analysis. This allows real-time inline monitoring of the resist deposition and exposure processes for improved yields. In addition, TEL Clean Track ACT 12 features a high-performance, multi-axis robotic handling solution to help with wafer handling and processing operations, further improving wafer production. TOKYO ELECTRON Clean Track ACT 12 is a powerful tool that enables enhanced lithography performance in the semiconductor industry with superior resolution capabilities. It also provides cost advantages with its energy efficient direct laser exposure model, thus ensuring processes are completed in the most efficient and precise manner.