Used TEL / TOKYO ELECTRON Clean Track ACT 7 #293656056 for sale

TEL / TOKYO ELECTRON Clean Track ACT 7 is a photoresist equipment consisting of a modular platform specially designed for advanced memory and high-density device manufacturing. This system features the highest level of automation and process control capabilities available for precise and fast parallel patterning for multi-level lithography. TEL Clean Track ACT 7 is a highly specialized piece of equipment based on projected-optical point processing, which is an innovative resist exposure technology developed by TEL. This technology employs a single-head liquid crystal (LC) projection unit to project finely tuned sub-micron pattern data onto illumination areas as small as 1 micron on the exposed resist film. This allows for extremely accurate image creation and clean resist patterning. The ACT 7 machine also features several automation capabilities, including a precision photomask changer and an automated slit-scan suppression and exposure head that enable it to maintain highly accurate image creation, through complex slit scanning without compromising image quality. This tool also has the ability to integrate several resist materials onto the same wafer, making it suitable for a wide variety of processes. Additionally, the ACT 7 supports a wide range of processes such as pre-exposure bake (PEB), post-exposure bake (PEB), and post-developmentbake (PDB). Its advanced lithography software also supports a variety of image formation modes, including automated optical proximity correction (OPC) and advanced pre and post pattern processes. In summary, TOKYO ELECTRON Clean Track ACT 7 is an advanced photoresist asset featuring a single-head liquid crystal projection model, automated slit-scan suppression and exposure head, precision photomask changer, and highly reliable lithography software that enable precise and clean patterning for advanced memory and high-density device manufacturing. It is suitable for a wide range of processes, such as PEB and PDB, and supports a large variety of image formation modes.