Used TEL / TOKYO ELECTRON Clean Track ACT 8 / ACT 12 #9138478 for sale

TEL / TOKYO ELECTRON Clean Track ACT 8 / ACT 12 is a photoresist equipment used to create high-resolution patterns with sub-micron components for various applications such as semiconductors and other microelectronic components. The system comes in two configurations - ACT 8 and ACT 12 - and is capable of processing up to 8- and 12-inch wafers respectively. The unit uses advanced process control algorithms to ensure accurate and repeatable etching results and is ideally suited to process photoresist layers in which the attributes of the underlying pattern are highly controllable at the sub-micron level. The machine's microprocessor-controlled process and exposure tool enables high precision patterning of sub-micron features. TEL Clean Track ACT 8 / ACT 12 offers an array of lithography and exposure options such as optical proximity correction (OPC), chemical-mechanical polishing (CMP) and laser-etching for ultraviolet (UV) and electron beam (EB) resists. The asset also provides several advanced features for substrate pre-treatment, thermal management and wafer processing such as built-in subsystems for stress/defect control, edge erosion, stabi-R processing and auto-check. The model is also designed for environmental protection with automated processes that continuously monitor gas usage and pressure levels, maintaining air supply inside the chamber to prevent cross-contamination and odor formation. Furthermore, the equipment has built-in safety features to ensure that the highest standards of protection are achieved. Overall, TOKYO ELECTRON Clean Track ACT 8 / ACT 12 provides an effective photoresist system for a variety of advanced lithography applications. Its ability to process both 8- and 12-inch wafers, combined with its flexible range of exposure and lithography options and advanced process control features make it an ideal solution for creating high-resolution patterns with sub-micron components.