Used TEL / TOKYO ELECTRON Clean Track ACT 8 #162692 for sale

TEL / TOKYO ELECTRON Clean Track ACT 8 is a photoresist equipment designed for applications such as semiconductor wafer photolithography. It is an advanced design featuring improvements to the traditional photoresist and SOLIDLINE PRECISION processes. The ACT 8 system allows for high resolution lithography with the reduction of process errors and contamination. At the core of the ACT 8 unit is its ECD (Electron Cyclotron Deposition) spraying agents, which serve to improve the quality of the photoresist layers. The agents are used during the sputter process, resulting in reduced defects and minimized potential for contamination. This allows for a larger area of the photoresist layer to be exposed, helping to ensure uniform thickness and an even surface topology. The ACT 8 machine also boasts improvements to the photoresist chemistry, giving it a much stronger bonding strength and improved coating capability. Its low lost rate and reduced need for corrections help to save both time and money when it comes to photolithography. In addition to the ECD spraying agents, the ACT 8 also utilizes TEL patented "pillar" technology, which helps to capture the photoresist materials more effectively, reducing the need for corrections and ensuring better uniformity with the photoresist layer. It also reduces the number of particles that could cause electrostatic discharge during the process. The ACT 8 tool also offers improved defect trapping and a deeper defect-free area. This helps to improve the quality of critical features during the lithography process, while also reducing the chances of scum and defect-related yield losses. Finally, the ACT 8 asset utilizes an expert software suite, which helps to analyze and predict the behavior of the photoresist layer and detect any potential problems before they become irreversible. The software also helps to reduce programming time, ensuring efficient production. TEL Clean Track ACT 8 provides an efficient and reliable way to process wafers with improved lithography processes, along with improved chemicals and software. This makes it an ideal choice for any semiconductor applications that require a complex photolithography process.