Used TEL / TOKYO ELECTRON Clean Track ACT 8 #293592456 for sale

TEL / TOKYO ELECTRON Clean Track ACT 8 is an advanced photoresist equipment designed for advanced nanotech lithography processes. The system is equipped with two scanners, one that operates in the ultraviolet and the other in the infrared. The unit is designed to provide exceptional accuracy and repeatability, as well as superior uniformity, even over long periods of operation. TEL Clean Track ACT 8 is a unique machine which utilizes an advanced auto-focus mechanism, proprietary insulation technology and active adjustment of the contrast ratio of the photoresist to ensure high dimensional accuracy of the resultant pattern. The auto-focus feature enables rapid, accurate, and repeatable optimization of focus position and depth, ensuring consistent high-precision pattern transfer. The patented insulation mechanism significantly reduces photoresist vibration or other sources of distortion during operation. Finally, the active contrast adjustment feature allows the tool to adjust contrast ratio according to the desired pattern resolution. TOKYO ELECTRON Clean Track ACT 8 is a four-track asset consisting of an illumination stage, a photolithography stage, a post-exposure bake (PEB) stage and a coating/developing stage. Optical components are isolated in a sealed environment on each stage to minimize contaminants. Special trapping devices are used to avoid generation of particles which can cause distortion in the pattern. The illumination and photolithography stages employ a variety of high-precision optics, including advanced optical hysteresis technology to keep distortion caused by thermal changes very low. The post-exposure bake stage is equipped with quartz halogen lamps which provide uniform heating. The temperature of the PEB process can be precisely adjusted to control the quality of pattern transfer. The post-exposure bake stage can accommodate up to eight cassettes, helping reduce time for post-exposure bake processes. The coating/developing stage is equipped with a high-accuracy robotic arm for precise movement of the wafers. The plasma generating unit is used for precise etching for pattern development as well as for wafer cleaning. The wafers are then exposed to a precise, high-resolution imaging optics for superior pattern transfer. Clean Track ACT 8 is a complete, high-precision photolithography model designed to maximize efficiency and ensure precise pattern transfer. Its advanced features make the equipment robust, reliable, accurate and repeatable, even over long periods of operation.