Used TEL / TOKYO ELECTRON Clean Track ACT 8 #293628555 for sale

TEL / TOKYO ELECTRON ACT 8 is a photoresist equipment for high-end lithographic processes. The system features a vertical resistance head which enables highly uniform, quality results. The high precision device provides exposure which is homogeneous across the entire resist surface. The unit is designed to have high repeatability when processing 0.5 μm structures and so can be used in demanding production lines. The device features a mask plane imaging lens which enables 1X to 5X reduction of the photoresist. The lens is capable of viewing and magnifying all aspects of the resist by manipulating the lens, providing a capability to achieve the desired results. The device has a step and repeat capability allowing it to expose multiple images, masks and films simultaneously in order to reduce cycle times. The machine can also accommodate substrates ranging from 4 inch to 6 inch and is capable of exposures of 5.6 μm or less. The tool has a built in Arm control, which enables users to manipulate the resist layer and accessorize the various parameters associated with photolithography, such as exposure dose, focus, and shutter speed. This feature makes the device an ideal choice for high precision wafer applications and production. The design of TEL ACT 8 is such that it enables users to monitor, automate and control all aspects of the photolithography process, from exposure to focus setting. The device has a built-in diagnostics which can provide information regarding the process performance and settings. The device also has temperature control settings which enable enhanced and precise control over the photolithography process. The asset utilizes high precision digital servo motors which enable much higher levels of accuracy compared to traditional analog servo motors. The unit also includes high repeatable alignment settings for precise positioning and alignment of the masks and films. All these features ensure that TOKYO ELECTRON ACT 8 is an ideal tool for achieving high-end lithographic processes. The device can facilitate processes such as the sub-quarter micron resolution projection lithography, which is one of the most advanced processes used in the semiconductor industry. The device is therefore suitable for any lithographic processing application that requires precise process control settings and accurate results.