Used TEL / TOKYO ELECTRON Clean Track ACT 8 #293821422 for sale

TEL / TOKYO ELECTRON ACT 8 is a specialized photoresist chemical processing equipment designed for photolithography applications. The system provides high accuracy in critical feature control and significant selectivity in design of various advanced lithographic structures. It offers a wide range of inspection, process and imaging capabilities to ensure optimum photoresist processing and advanced lithographic design structures. The unit includes a mask aligner with a vacuum chuck, a multi-track scanner, an exposure unit and a developer assembly. The newly designed nano-positioner of the mask aligner ensures accurate and consistent sub-micron alignment accuracy with repeatability of ±3 nm, allowing for highly accurate film contact and high-throughput. The multi-track scanner provides high-speed scanning with adjustable beam spot sizes and advanced imaging capabilities for scan rosetta printing and advanced lithography techniques. The exposure unit provides the ability to control the dose to a high degree of accuracy and a choice of light sources for different substrate materials and process requirements. The developer assembly provides automated control of chemical processing times and temperatures, enabling the machine to achieve optimal circuit performance. The tool includes a digital library of recipes and process history to ensure operator efficiency and repeatability while also increasing data traceability. The library is compatible with all supported systems (Windows/Linux operating systems) and can be seamlessly integrated with existing software and hardware libraries. With a wide variety of integrated simulation tools and analytics, TEL ACT 8 helps ensure circuit performance and structures that meet exact performance requirements. Overall, TOKYO ELECTRON ACT 8 provides the highest accuracy, selectivity and throughput in the industry, with the widest range of inspection, process and imaging capabilities to ensure optimum photoresist processing and design of advanced lithographic structures. The asset's ability to handle substrate materials and process requirements with precision, accuracy, and speed makes it an ideal choice for photolithography applications.